I-HPSI SiC Wafer ≥90% Udidi lwe-Transmittance Optical kwiiglasi ze-AI/AR
Intshayelelo ePhambili: Indima yeeWafers zeHPSI SiC kwiiglasi ze-AI/AR
Ii-wafer zeSilicon Carbide zeHPSI (High-Purity Semi-Insulating) zii-wafers ezikhethekileyo eziphawulwa kukumelana okuphezulu (>10⁹ Ω·cm) kunye noxinano oluphantsi kakhulu lwesiphene. Kwiiglasi ze-AI/AR, ngokuyintloko zisebenza njengezinto ezisisiseko ze-substrate zeelensi ze-optical waveguide diffractive, zijongana neengxaki ezinxulumene nezixhobo ze-optical zendabuko ngokwezinto ezincinci nezikhanyayo, ukusasazwa kobushushu, kunye nokusebenza kwe-optical. Umzekelo, iiglasi ze-AR ezisebenzisa iilensi ze-SiC waveguide zinokufikelela kwi-ultra-wide field of view (FOV) ye-70°–80°, ngelixa zinciphisa ubukhulu belensi enye ukuya kwi-0.55mm kunye nobunzima ukuya kwi-2.7g kuphela, nto leyo ephucula kakhulu intuthuzelo yokunxiba kunye nokuntywiliselwa emehlweni.
Iimpawu eziphambili: Indlela iSiC Material enika amandla ngayo uyilo lweeglasi ze-AI/AR
I-High Refractive Index kunye ne-Optical Performance Optimization
- Isalathisi sokukhanyela (2.6–2.7) seSiC siphezulu phantse ngama-50% kuneseglasi yendabuko (1.8–2.0). Oku kuvumela izakhiwo zesikhokelo samaza ezibhityileyo nezisebenza kakuhle, nto leyo eyandisa kakhulu i-FOV. Isalathisi sokukhanyela esiphezulu sikwanceda ekucinezeleni "isiphumo somnyama" esiqhelekileyo kwiisikhokelo zamaza ezisasazekayo, nto leyo ephucula ubumsulwa bomfanekiso.
Amandla oLawulo oluPhezulu lweThermal
- Ngombane ohamba ngobushushu ofikelela kwi-490 W/m·K (phantse nowethusi), i-SiC inokususa ngokukhawuleza ubushushu obuveliswa ziimodyuli ze-Micro-LED display. Oku kuthintela ukonakala kokusebenza okanye ukuguga kwesixhobo ngenxa yobushushu obuphezulu, okuqinisekisa ubomi bebhetri obude kunye nozinzo oluphezulu.
Amandla oomatshini kunye nokuhlala ixesha elide
- I-SiC inobunzima be-Mohs obuyi-9.5 (ilandela idayimani kuphela), inika ukumelana okungaqhelekanga kokukrwela, nto leyo eyenza ukuba ilungele iiglasi ezisetyenziswa rhoqo. Uburhabaxa bayo bomphezulu bunokulawulwa ukuya kwi-Ra < 0.5 nm, ukuqinisekisa ukuhanjiswa kokukhanya okufanayo kwii-waveguides.
Ukuhambelana kwePropati yoMbane
- Ukumelana kwe-HPSI SiC (>10⁹ Ω·cm) kunceda ukuthintela ukuphazamiseka kwesignali. Ingasebenza njengesixhobo sombane esisebenzayo, iphucula iimodyuli zolawulo lwamandla kwiiglasi ze-AR.
Imiyalelo yesicelo esiphambili
Izinto eziphambili ze-Optical ze-AI/AR Glasses
- Iilensi zeDiffractive Waveguide: Ii-substrates zeSiC zisetyenziselwa ukwenza ii-waveguide ze-optical ezibhityileyo kakhulu ezixhasa i-FOV enkulu kunye nokususa isiphumo se-rainbow.
- Iipleyiti zefestile kunye neePrism: Ngokusika nokupolisha ngokwezifiso, iSiC ingacutshungulwa ibe ziifestile ezikhuselayo okanye iiprism ezibonakalayo zeeglasi ze-AR, nto leyo ephucula ukuhanjiswa kokukhanya kunye nokumelana nokuguguleka.
Izicelo Ezandisiweyo Kwezinye Iinkalo
- I-Power Electronics: Isetyenziswa kwiimeko ezisebenzisa amandla amaninzi, ezifana nee-inverters ezintsha zezithuthi zamandla kunye nolawulo lweemoto zoshishino.
- I-Quantum Optics: Isebenza njengomgcini weendawo zombala, isetyenziswa kwizixhobo zonxibelelwano lwe-quantum kunye nezixhobo zokuva.
Uthelekiso lweeNkcukacha ze-HPSI SiC Substrate ezi-4 intshi kunye nezi-6 intshi
| Ipharamitha | Ibanga | I-substrate ye-intshi ezi-4 | I-substrate ye-intshi ezi-6 |
| Ububanzi | Ibanga le-Z / iBanga le-D | 99.5 mm - 100.0 mm | 149.5 mm - 150.0 mm |
| Uhlobo lwePoly | Ibanga le-Z / iBanga le-D | 4H | 4H |
| Ubukhulu | Ibanga lika-Z | 500 μm ± 15 μm | 500 μm ± 15 μm |
| Ibanga le-D | 500 μm ± 25 μm | 500 μm ± 25 μm | |
| Ukuqhelaniswa kweWafer | Ibanga le-Z / iBanga le-D | Kwi-axis: <0001> ± 0.5° | Kwi-axis: <0001> ± 0.5° |
| Ubuninzi beMicropipe | Ibanga lika-Z | ≤ 1 cm² | ≤ 1 cm² |
| Ibanga le-D | ≤ 15 cm² | ≤ 15 cm² | |
| Ukumelana | Ibanga lika-Z | ≥ 1E10 Ω·cm | ≥ 1E10 Ω·cm |
| Ibanga le-D | ≥ 1E5 Ω·cm | ≥ 1E5 Ω·cm | |
| Isikhokelo esiSiseko esiPhambili | Ibanga le-Z / iBanga le-D | (10-10) ± 5.0° | (10-10) ± 5.0° |
| Ubude obuPhambili obuSicaba | Ibanga le-Z / iBanga le-D | 32.5 mm ± 2.0 mm | I-Notch |
| Ubude obuSicaba beSibini | Ibanga le-Z / iBanga le-D | 18.0 mm ± 2.0 mm | - |
| Ukukhutshwa komda | Ibanga le-Z / iBanga le-D | 3 mm | 3 mm |
| I-LTV / i-TTV / iBow / iWarp | Ibanga lika-Z | ≤ 2.5 μm / ≤ 5 μm / ≤ 15 μm / ≤ 30 μm | ≤ 2.5 μm / ≤ 6 μm / ≤ 25 μm / ≤ 35 μm |
| Ibanga le-D | ≤ 10 μm / ≤ 15 μm / ≤ 25 μm / ≤ 40 μm | ≤ 5 μm / ≤ 15 μm / ≤ 40 μm / ≤ 80 μm | |
| Uburhabaxa | Ibanga lika-Z | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm |
| Ibanga le-D | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.5 nm | |
| Iingcangca zomphetho | Ibanga le-D | Indawo eqokelelweyo ≤ 0.1% | Ubude obuqokelelweyo ≤ 20 mm, enye ≤ 2 mm |
| Iindawo zePolytype | Ibanga le-D | Indawo eqokelelweyo ≤ 0.3% | Indawo eqokelelweyo ≤ 3% |
| Izinto ezibandakanyiweyo zeCarbon ebonakalayo | Ibanga lika-Z | Indawo eqokelelweyo ≤ 0.05% | Indawo eqokelelweyo ≤ 0.05% |
| Ibanga le-D | Indawo eqokelelweyo ≤ 0.3% | Indawo eqokelelweyo ≤ 3% | |
| Imikrwelo yeSilicon Surface | Ibanga le-D | 5 zivumelekile, nganye ≤1mm | Ubude obuqokelelweyo ≤ 1 x ububanzi |
| Iitships ze-Edge | Ibanga lika-Z | Akukho nto ivumelekileyo (ububanzi nobunzulu ≥0.2mm) | Akukho nto ivumelekileyo (ububanzi nobunzulu ≥0.2mm) |
| Ibanga le-D | 7 zivunyelwe, nganye ≤1mm | 7 zivunyelwe, nganye ≤1mm | |
| Ukususwa kweSikrufu sokuTshintsha imisonto | Ibanga lika-Z | - | ≤ 500 cm² |
| Ukupakisha | Ibanga le-Z / iBanga le-D | Ikhasethi yeewafer ezininzi okanye isitya sewafer esinye | Ikhasethi yeewafer ezininzi okanye isitya sewafer esinye |
Iinkonzo ze-XKH: Amandla okuVelisa kunye nokuLungisa ngokuHlangeneyo
Inkampani ye-XKH inamandla okudibanisa ngokuthe nkqo ukusuka kwizinto eziluhlaza ukuya kwii-wafers ezigqityiweyo, ezigubungela lonke uthotho lokukhula kwe-SiC substrate, ukunqunqa, ukupolisha, kunye nokucutshungulwa ngokwezifiso. Iingenelo eziphambili zenkonzo ziquka:
- Ukwahlukahluka kwezinto:Singabonelela ngeentlobo ezahlukeneyo ze-wafer ezifana nohlobo lwe-4H-N, uhlobo lwe-4H-HPSI, uhlobo lwe-4H/6H-P, kunye nohlobo lwe-3C-N. Ukumelana, ubukhulu, kunye nokujonga kunokulungiswa ngokweemfuno.
- .Uhlengahlengiso lobungakanani obuguquguqukayo:Sixhasa ukucutshungulwa kwe-wafer ukusuka kwiisentimitha ezi-2 ukuya kwiisentimitha ezili-12, kwaye sinokucutshungulwa nezakhiwo ezikhethekileyo ezifana neziqwenga zesikwere (umz., 5x5mm, 10x10mm) kunye neeprism ezingaqhelekanga.
- Ulawulo Lokuchaneka Kwezinga Lokukhanya:I-Wafer Total Thickness Variation (TTV) inokugcinwa kwi-<1μm, kunye ne-surface roughness kwi-Ra < 0.3 nm, ukuhlangabezana neemfuno ze-nano-level flatness zezixhobo ze-waveguide.
- Impendulo ekhawulezayo kwiMarike:Imodeli yeshishini edibeneyo iqinisekisa utshintsho olusebenzayo ukusuka kwi-R&D ukuya kwimveliso enkulu, ixhasa yonke into ukusuka ekuqinisekisweni kwebhetshi encinci ukuya ekuthunyelweni okukhulu (ixesha lokukhokela lihlala liziintsuku ezili-15-40).

Imibuzo ebuzwa rhoqo nge-HPSI SiC Wafer
Umbuzo 1: Kutheni i-HPSI SiC ithathwa njengesixhobo esifanelekileyo kwiilensi ze-AR waveguide?
A1: Isalathisi sayo esiphezulu sokurhawuzelela (2.6–2.7) senza izakhiwo ezibhityileyo nezisebenza kakuhle ze-waveguide ezixhasa intsimi enkulu yombono (umz., 70°–80°) ngelixa zisusa "isiphumo somnyama".
Umbuzo 2: I-HPSI SiC iluphucula njani ulawulo lobushushu kwiiglasi ze-AI/AR?
A2: Ngombane oqhuba ubushushu ofikelela kwi-490 W/m·K (kufuphi nobhedu), isusa ubushushu ngokufanelekileyo kwiindawo ezifana neeMicro-LED, iqinisekisa ukusebenza okuzinzileyo kunye nobomi bexesha elide besixhobo.
Umbuzo 3: Zeziphi iingenelo zokuqina ezibonelelwa yiHPSI SiC kwiiglasi ezinxitywayo?
A3: Ubunzima bayo obungaqhelekanga (Mohs 9.5) bubonelela ngokumelana nokukrwela okungcono, nto leyo eyenza ukuba ihlale ixesha elide xa isetyenziswa imihla ngemihla kwiiglasi ze-AR ezisetyenziswa ngabathengi.













