I-HPSI SiC Wafer ≥90% Udidi lwe-Transmittance Optical kwiiglasi ze-AI/AR​

Inkcazo emfutshane:

Ipharamitha

Ibanga

I-substrate ye-intshi ezi-4

I-substrate ye-intshi ezi-6

Ububanzi​​

Ibanga le-Z / iBanga le-D

99.5 mm – 100.0 mm

149.5 mm – 150.0 mm

Uhlobo lwePoly

Ibanga le-Z / iBanga le-D

4H

4H

Ubukhulu

Ibanga lika-Z

500 μm ± 15 μm

500 μm ± 15 μm

Ibanga le-D

500 μm ± 25 μm

500 μm ± 25 μm

Ukuqhelaniswa kweWafer

Ibanga le-Z / iBanga le-D

Kwi-axis: <0001> ± 0.5°

Kwi-axis: <0001> ± 0.5°

Ubuninzi beMicropipe

Ibanga lika-Z

≤ 1 cm²

≤ 1 cm²

Ibanga le-D

≤ 15 cm²

≤ 15 cm²

Ukumelana

Ibanga lika-Z

≥ 1E10 Ω·cm

≥ 1E10 Ω·cm

Ibanga le-D

≥ 1E5 Ω·cm

≥ 1E5 Ω·cm


Iimbonakalo

Intshayelelo ePhambili: Indima yeeWafers zeHPSI SiC kwiiglasi ze-AI/AR

Ii-wafer zeSilicon Carbide zeHPSI (High-Purity Semi-Insulating) zii-wafers ezikhethekileyo eziphawulwa kukumelana okuphezulu (>10⁹ Ω·cm) kunye noxinano oluphantsi kakhulu lwesiphene. Kwiiglasi ze-AI/AR, ngokuyintloko zisebenza njengezinto ezisisiseko ze-substrate zeelensi ze-optical waveguide diffractive, zijongana neengxaki ezinxulumene nezixhobo ze-optical zendabuko ngokwezinto ezincinci nezikhanyayo, ukusasazwa kobushushu, kunye nokusebenza kwe-optical. Umzekelo, iiglasi ze-AR ezisebenzisa iilensi ze-SiC waveguide zinokufikelela kwi-ultra-wide field of view (FOV) ye-70°–80°, ngelixa zinciphisa ubukhulu belensi enye ukuya kwi-0.55mm kunye nobunzima ukuya kwi-2.7g kuphela, nto leyo ephucula kakhulu intuthuzelo yokunxiba kunye nokuntywiliselwa emehlweni.

Iimpawu eziphambili: Indlela iSiC Material enika amandla ngayo uyilo lweeglasi ze-AI/AR​

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I-High Refractive Index kunye ne-Optical Performance Optimization​

  • Isalathisi sokukhanyela (2.6–2.7) seSiC siphezulu phantse ngama-50% kuneseglasi yendabuko (1.8–2.0). Oku kuvumela izakhiwo zesikhokelo samaza ezibhityileyo nezisebenza kakuhle, nto leyo eyandisa kakhulu i-FOV. Isalathisi sokukhanyela esiphezulu sikwanceda ekucinezeleni "isiphumo somnyama" esiqhelekileyo kwiisikhokelo zamaza ezisasazekayo, nto leyo ephucula ubumsulwa bomfanekiso.

Amandla oLawulo oluPhezulu lweThermal​

  • Ngombane ohamba ngobushushu ofikelela kwi-490 W/m·K (phantse nowethusi), i-SiC inokususa ngokukhawuleza ubushushu obuveliswa ziimodyuli ze-Micro-LED display. Oku kuthintela ukonakala kokusebenza okanye ukuguga kwesixhobo ngenxa yobushushu obuphezulu, okuqinisekisa ubomi bebhetri obude kunye nozinzo oluphezulu.

Amandla oomatshini kunye nokuhlala ixesha elide

  • I-SiC inobunzima be-Mohs obuyi-9.5 (ilandela idayimani kuphela), inika ukumelana okungaqhelekanga kokukrwela, nto leyo eyenza ukuba ilungele iiglasi ezisetyenziswa rhoqo. Uburhabaxa bayo bomphezulu bunokulawulwa ukuya kwi-Ra < 0.5 nm, ukuqinisekisa ukuhanjiswa kokukhanya okufanayo kwii-waveguides.

Ukuhambelana kwePropati yoMbane​

  • Ukumelana kwe-HPSI SiC (>10⁹ Ω·cm) kunceda ukuthintela ukuphazamiseka kwesignali. Ingasebenza njengesixhobo sombane esisebenzayo, iphucula iimodyuli zolawulo lwamandla kwiiglasi ze-AR.

Imiyalelo yesicelo esiphambili

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ikopi_副本

Izinto eziphambili ze-Optical ze-AI/AR Glasses

  • Iilensi zeDiffractive Waveguide: Ii-substrates zeSiC zisetyenziselwa ukwenza ii-waveguide ze-optical ezibhityileyo kakhulu ezixhasa i-FOV enkulu kunye nokususa isiphumo se-rainbow.
  • Iipleyiti zefestile kunye neePrism: Ngokusika nokupolisha ngokwezifiso, iSiC ingacutshungulwa ibe ziifestile ezikhuselayo okanye iiprism ezibonakalayo zeeglasi ze-AR, nto leyo ephucula ukuhanjiswa kokukhanya kunye nokumelana nokuguguleka.

 

Izicelo Ezandisiweyo Kwezinye Iinkalo​

  • I-Power Electronics: Isetyenziswa kwiimeko ezisebenzisa amandla amaninzi, ezifana nee-inverters ezintsha zezithuthi zamandla kunye nolawulo lweemoto zoshishino.
  • I-Quantum Optics: Isebenza njengomgcini weendawo zombala, isetyenziswa kwizixhobo zonxibelelwano lwe-quantum kunye nezixhobo zokuva.

Uthelekiso lweeNkcukacha ze-HPSI SiC Substrate ezi-4 intshi kunye nezi-6 intshi

Ipharamitha

Ibanga

I-substrate ye-intshi ezi-4

I-substrate ye-intshi ezi-6

Ububanzi​​

Ibanga le-Z / iBanga le-D

99.5 mm - 100.0 mm

149.5 mm - 150.0 mm

Uhlobo lwePoly

Ibanga le-Z / iBanga le-D

4H

4H

Ubukhulu

Ibanga lika-Z

500 μm ± 15 μm

500 μm ± 15 μm

Ibanga le-D

500 μm ± 25 μm

500 μm ± 25 μm

Ukuqhelaniswa kweWafer

Ibanga le-Z / iBanga le-D

Kwi-axis: <0001> ± 0.5°

Kwi-axis: <0001> ± 0.5°

Ubuninzi beMicropipe

Ibanga lika-Z

≤ 1 cm²

≤ 1 cm²

Ibanga le-D

≤ 15 cm²

≤ 15 cm²

Ukumelana

Ibanga lika-Z

≥ 1E10 Ω·cm

≥ 1E10 Ω·cm

Ibanga le-D

≥ 1E5 Ω·cm

≥ 1E5 Ω·cm

Isikhokelo esiSiseko esiPhambili​

Ibanga le-Z / iBanga le-D

(10-10) ± 5.0°

(10-10) ± 5.0°

Ubude obuPhambili obuSicaba​

Ibanga le-Z / iBanga le-D

32.5 mm ± 2.0 mm

I-Notch

Ubude obuSicaba beSibini

Ibanga le-Z / iBanga le-D

18.0 mm ± 2.0 mm

-

Ukukhutshwa komda

Ibanga le-Z / iBanga le-D

3 mm

3 mm

I-LTV / i-TTV / iBow / iWarp

Ibanga lika-Z

≤ 2.5 μm / ≤ 5 μm / ≤ 15 μm / ≤ 30 μm

≤ 2.5 μm / ≤ 6 μm / ≤ 25 μm / ≤ 35 μm

Ibanga le-D

≤ 10 μm / ≤ 15 μm / ≤ 25 μm / ≤ 40 μm

≤ 5 μm / ≤ 15 μm / ≤ 40 μm / ≤ 80 μm

Uburhabaxa​

Ibanga lika-Z

I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm

I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm

Ibanga le-D

I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm

I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.5 nm

Iingcangca zomphetho

Ibanga le-D

Indawo eqokelelweyo ≤ 0.1%

Ubude obuqokelelweyo ≤ 20 mm, enye ≤ 2 mm

Iindawo zePolytype

Ibanga le-D

Indawo eqokelelweyo ≤ 0.3%

Indawo eqokelelweyo ≤ 3%

Izinto ezibandakanyiweyo zeCarbon ebonakalayo

Ibanga lika-Z

Indawo eqokelelweyo ≤ 0.05%

Indawo eqokelelweyo ≤ 0.05%

Ibanga le-D

Indawo eqokelelweyo ≤ 0.3%

Indawo eqokelelweyo ≤ 3%

Imikrwelo yeSilicon Surface

Ibanga le-D

5 zivumelekile, nganye ≤1mm

Ubude obuqokelelweyo ≤ 1 x ububanzi

Iitships ze-Edge

Ibanga lika-Z

Akukho nto ivumelekileyo (ububanzi nobunzulu ≥0.2mm)

Akukho nto ivumelekileyo (ububanzi nobunzulu ≥0.2mm)

Ibanga le-D

7 zivunyelwe, nganye ≤1mm

7 zivunyelwe, nganye ≤1mm

Ukususwa kweSikrufu sokuTshintsha imisonto

Ibanga lika-Z

-

≤ 500 cm²

Ukupakisha​

Ibanga le-Z / iBanga le-D

Ikhasethi yeewafer ezininzi okanye isitya sewafer esinye

Ikhasethi yeewafer ezininzi okanye isitya sewafer esinye

Iinkonzo ze-XKH: Amandla okuVelisa kunye nokuLungisa ngokuHlangeneyo​

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Inkampani ye-XKH inamandla okudibanisa ngokuthe nkqo ukusuka kwizinto eziluhlaza ukuya kwii-wafers ezigqityiweyo, ezigubungela lonke uthotho lokukhula kwe-SiC substrate, ukunqunqa, ukupolisha, kunye nokucutshungulwa ngokwezifiso. Iingenelo eziphambili zenkonzo ziquka:

  1. Ukwahlukahluka kwezinto:Singabonelela ngeentlobo ezahlukeneyo ze-wafer ezifana nohlobo lwe-4H-N, uhlobo lwe-4H-HPSI, uhlobo lwe-4H/6H-P, kunye nohlobo lwe-3C-N. Ukumelana, ubukhulu, kunye nokujonga kunokulungiswa ngokweemfuno.
  2. .Uhlengahlengiso lobungakanani obuguquguqukayo​​:Sixhasa ukucutshungulwa kwe-wafer ukusuka kwiisentimitha ezi-2 ukuya kwiisentimitha ezili-12, kwaye sinokucutshungulwa nezakhiwo ezikhethekileyo ezifana neziqwenga zesikwere (umz., 5x5mm, 10x10mm) kunye neeprism ezingaqhelekanga.
  3. Ulawulo Lokuchaneka Kwezinga Lokukhanya:I-Wafer Total Thickness Variation (TTV) inokugcinwa kwi-<1μm, kunye ne-surface roughness kwi-Ra < 0.3 nm, ukuhlangabezana neemfuno ze-nano-level flatness zezixhobo ze-waveguide.
  4. Impendulo ekhawulezayo kwiMarike:Imodeli yeshishini edibeneyo iqinisekisa utshintsho olusebenzayo ukusuka kwi-R&D ukuya kwimveliso enkulu, ixhasa yonke into ukusuka ekuqinisekisweni kwebhetshi encinci ukuya ekuthunyelweni okukhulu (ixesha lokukhokela lihlala liziintsuku ezili-15-40).91ceb86f-2323-45ca-ba96-cee165a84703

 

Imibuzo ebuzwa rhoqo nge-HPSI SiC Wafer

Umbuzo 1: Kutheni i-HPSI SiC ithathwa njengesixhobo esifanelekileyo kwiilensi ze-AR waveguide?
A1: Isalathisi sayo esiphezulu sokurhawuzelela (2.6–2.7) senza izakhiwo ezibhityileyo nezisebenza kakuhle ze-waveguide ezixhasa intsimi enkulu yombono (umz., 70°–80°) ngelixa zisusa "isiphumo somnyama".
Umbuzo 2: I-HPSI SiC iluphucula njani ulawulo lobushushu kwiiglasi ze-AI/AR?
A2: Ngombane oqhuba ubushushu ofikelela kwi-490 W/m·K (kufuphi nobhedu), isusa ubushushu ngokufanelekileyo kwiindawo ezifana neeMicro-LED, iqinisekisa ukusebenza okuzinzileyo kunye nobomi bexesha elide besixhobo.
Umbuzo 3: Zeziphi iingenelo zokuqina ezibonelelwa yiHPSI SiC kwiiglasi ezinxitywayo?
A3: Ubunzima bayo obungaqhelekanga (Mohs 9.5) bubonelela ngokumelana nokukrwela okungcono, nto leyo eyenza ukuba ihlale ixesha elide xa isetyenziswa imihla ngemihla kwiiglasi ze-AR ezisetyenziswa ngabathengi.


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