I-8Inch 200mm 4H-N SiC Wafer Ibanga lophando lwe-dummy

Inkcazelo emfutshane:

Njengoko ezothutho, amandla kunye neemarike zemizi-mveliso zikhula, imfuno yezinto ezithembekileyo, ezisebenza ngamandla e-elektroniki ziyaqhubeka ukukhula. Ukuhlangabezana neemfuno zentsebenzo ephuculweyo ye-semiconductor, abavelisi besixhobo bajonge kwi-wide bandgap semiconductor materials, ezifana ne-4H SiC Prime Grade portfolio yethu ye-4H n -type silicon carbide (SiC) wafers.


Iinkcukacha zeMveliso

Iithegi zeMveliso

Ngenxa yeempawu zayo ezizodwa kunye ne-elektroniki, i-200mm SiC wafer semiconductor imathiriyeli isetyenziselwa ukwenza ukusebenza okuphezulu, ubushushu obuphezulu, ukumelana nemitha, kunye nezixhobo zombane ezisebenza kakhulu. Ixabiso le-substrate ye-8inch SiC liyehla ngokuthe ngcembe njengoko itekhnoloji ihambela phambili ngakumbi kwaye imfuno ikhula. Uphuhliso lwetekhnoloji yakutsha nje lukhokelela ekuvelisweni kwesikali sokwenziwa kwee-wafers ze-SiC ezingama-200mm. Iinzuzo eziphambili ze-SiC wafer semiconductor materials xa kuthelekiswa ne-Si kunye ne-GaAs wafers: Amandla ombane ombane we-4H-SiC ngexesha lokuphuka kwe-avalanche ingaphezulu komyalelo wobukhulu obuphezulu kunexabiso elihambelanayo le-Si kunye ne-GaAs. Oku kukhokelela ekunciphiseni okubonakalayo kwi-restivity ye-Ron. I-Low-state resistivity, idityaniswe noxinano oluphezulu lwangoku kunye ne-thermal conductivity, ivumela ukusetyenziswa kokufa okuncinci kakhulu kwizixhobo zamandla. I-conductivity ephezulu ye-thermal ye-SiC inciphisa ukuxhathisa kwe-thermal ye-chip. Iimpawu ze-elektroniki zezixhobo ezisekelwe kwii-wafers ze-SiC zizinzile kakhulu ngexesha kunye neqondo lokushisa elizinzileyo, eliqinisekisa ukuthembeka okuphezulu kweemveliso. I-silicon carbide ixhathisa ngokugqithiseleyo kwi-radiation enzima, engayithobiyo i-electronic properties ye-chip. Iqondo lokushisa eliphezulu elilinganiselweyo le-crystal (ngaphezu kwe-6000C) likuvumela ukuba wenze izixhobo ezinokwethenjelwa kakhulu kwiimeko zokusebenza ezinzima kunye nezicelo ezizodwa. Okwangoku, sinokubonelela ngee-wafers ezincinci ze-200mmSiC ngokuthe ngcembe kwaye ngokuqhubekayo kwaye sibe nesitokhwe kwindawo yokugcina.

Inkcazo

Inani Into Iyunithi Imveliso Uphando Dummy
1. Iiparamitha
1.1 i-polytype -- 4H 4H 4H
1.2 ukuqhelaniswa nomphezulu ° <11-20>4±0.5 <11-20>4±0.5 <11-20>4±0.5
2. Ipharamitha yombane
2.1 dopant -- n-uhlobo lweNitrojeni n-uhlobo lweNitrojeni n-uhlobo lweNitrojeni
2.2 ukumelana ohm ·cm 0.015~0.025 0.01~0.03 NA
3. Mechanical parameter
3.1 ububanzi mm 200±0.2 200±0.2 200±0.2
3.2 ubukhulu μm 500±25 500±25 500±25
3.3 Ukuqhelaniswa nenotshi ° [1- 100] ±5 [1- 100] ±5 [1- 100] ±5
3.4 Ubunzulu beNotshi mm 1~1.5 1~1.5 1~1.5
3.5 LTV μm ≤5(10mm*10mm) ≤5(10mm*10mm) ≤10(10mm*10mm)
3.6 TTV μm ≤10 ≤10 ≤15
3.7 Ukuqubuda μm -25~25 -45~45 -65~65
3.8 I-Wap μm ≤30 ≤50 ≤70
3.9 AFM nm Ra≤0.2 Ra≤0.2 Ra≤0.2
4. Ubume
4.1 ukuxinana kwemibhobho uya/cm2 ≤2 ≤10 ≤50
4.2 umxholo wesinyithi iiathom/cm2 ≤1E11 ≤1E11 NA
4.3 TSD uya/cm2 ≤500 ≤1000 NA
4.4 I-BPD uya/cm2 ≤2000 ≤5000 NA
4.5 TED uya/cm2 ≤7000 ≤10000 NA
5. Umgangatho oncomekayo
5.1 ngaphambili -- Si Si Si
5.2 umphezulu wokugqiba -- Si-ubuso CMP Si-ubuso CMP Si-ubuso CMP
5.3 isuntswana i-ea/wafer ≤100(ubukhulu≥0.3μm) NA NA
5.4 umkrwelo i-ea/wafer ≤5, UBude buBonke≤200mm NA NA
5.5 Edge
iitshiphusi/iziindenti/iintanda/amabala/ungcoliseko
-- Akukho nanye Akukho nanye NA
5.6 Iindawo zePolytype -- Akukho nanye Indawo ≤10% Indawo ≤30%
5.7 uphawu lwangaphambili -- Akukho nanye Akukho nanye Akukho nanye
6. Umgangatho wasemva
6.1 emva kokugqiba -- C-ubuso MP C-ubuso MP C-ubuso MP
6.2 umkrwelo mm NA NA NA
6.3 Umqolo uneziphene edge
iitshiphusi/iindidi
-- Akukho nanye Akukho nanye NA
6.4 Umqolo uburhabaxa nm Ra≤5 Ra≤5 Ra≤5
6.5 Ukumakisha ngasemva -- Inotshi Inotshi Inotshi
7. Ungqameko
7.1 edge -- Chamfer Chamfer Chamfer
8. Iphakheji
8.1 ukupakishwa -- I-Epi-ilungile kunye ne-vacuum
ukupakishwa
I-Epi-ilungile kunye ne-vacuum
ukupakishwa
I-Epi-ilungile kunye ne-vacuum
ukupakishwa
8.2 ukupakishwa -- I-Multi-wafer
ukupakishwa kweekhasethi
I-Multi-wafer
ukupakishwa kweekhasethi
I-Multi-wafer
ukupakishwa kweekhasethi

Idayagram eneenkcukacha

8intshi iSiC03
8intshi SiC4
8intshi SiC5
8intshi SiC6

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