150mm 6 intshi 0.7mm 0.5mm iSapphire Wafer Substrate Carrier C-Plane SSP/DSP
Usetyenziso
Usetyenziso lwee-intshi ze-6-intshi zesafire zibandakanya:
1. Ukuveliswa kwe-LED: i-sapphire wafer ingasetyenziselwa njenge-substrate ye-chips ze-LED, kwaye ubunzima bayo kunye ne-thermal conductivity inokuphucula ukuzinza kunye nobomi benkonzo yee-chips ze-LED.
2. Ukwenziwa kweLaser: I-Sapphire wafer ingasetyenziselwa njenge-substrate ye-laser, ukunceda ukuphucula ukusebenza kwe-laser kunye nokwandisa ubomi benkonzo.
3. Ukuveliswa kweSemiconductor: Iifalu zeSapphire zisetyenziswa ngokubanzi ekwenzeni izixhobo ze-elektroniki kunye ne-optoelectronic, kubandakanywa i-optical synthesis, iiseli zelanga, izixhobo ze-elektroniki ze-high-frequency, njl.
4. Ezinye izicelo: I-Sapphire wafer ingasetyenziselwa ukwenza isikrini sokuchukumisa, izixhobo zamehlo, iiseli zelanga zefilimu ezincinci kunye nezinye iimveliso eziphezulu.
Inkcazo
Izinto eziphathekayo | Ukucoceka okuphezulu kwekristale enye Al2O3, isafire yesafire. |
Ubungakanani | 150 mm +/- 0.05 mm, 6 intshi |
Ukutyeba | 1300 +/- 25 um |
Ukuqhelaniswa | C indiza (0001) isuka ku-M (1-100) kwinqwelomoya 0.2 +/- 0.05 degree |
Ukuqhelaniswa neflethi ephambili | Inqwelomoya +/- 1 idigri |
Ubude beflethi bokuqala | 47.5 mm +/- 1 mm |
Ukwahluka koKutyeba ngokupheleleyo (TTV) | <20 um |
Ukuqubuda | <25 um |
I-Wap | <25 um |
I-Coefficient yoKwandiswa kweThermal | 6.66 x 10-6 / °C ngokuhambelana nomgca weC, 5 x 10-6 / °C perpendicular to C axis |
Amandla eDielectric | 4.8 x 105 V / cm |
Dielectric Constant | 11.5 (1 MHz) ecaleni komgca ongu-C, 9.3 (1 MHz) ngokuthe ngqo ukuya kumgca ongu-C |
I-Dielectric Loss Tangent (eyaziwa ngokuba yi-dissipation factor) | ngaphantsi kwe-1 x 10-4 |
I-Thermal Conductivity | 40 W/(mK) ku-20℃ |
Ukugudisa | icala elinye elikhazimlisiweyo (SSP) okanye icala eligudisiweyo eliphindwe kabini (DSP) Ra <0.5 nm (nge-AFM). Icala elingasemva le-SSP wafer lalingumhlaba olungileyo ukuya kuRa = 0.8 - 1.2 um. |
Ugqithiso | 88% +/-1 % @460 nm |