I-wafer ye-SiC ye-4H/6H-P eyi-6intshi ye-Zero MPD yebanga leMveliso yeBanga eliyiDummy

Inkcazo emfutshane:

I-wafer ye-SiC ye-4H/6H-P yohlobo lwe-6-intshi sisixhobo se-semiconductor esisetyenziswa ekwenzeni izixhobo ze-elektroniki, esaziwa ngokuqhuba kwayo kakuhle kobushushu, i-voltage ephezulu yokuqhekeka, kunye nokumelana namaqondo obushushu aphezulu kunye nokugqwala. I-Production-grade kunye ne-Zero MPD (Micro Pipe Defect) grade ziqinisekisa ukuthembeka kunye nozinzo kwi-electronics yamandla asebenza kakhulu. Ii-wafers ze-Production-grade zisetyenziselwa ukwenziwa kwezixhobo ezinkulu ngolawulo olungqongqo lomgangatho, ngelixa ii-wafers ze-dummy-grade zisetyenziselwa ikakhulu ukusombulula iingxaki zenkqubo kunye novavanyo lwezixhobo. Iimpawu ezibalaseleyo ze-SiC zenza ukuba isetyenziswe kakhulu kwizixhobo ze-elektroniki ezisebenzisa ubushushu obuphezulu, i-voltage ephezulu, kunye ne-frequency ephezulu, njengezixhobo zamandla kunye nezixhobo ze-RF.


Iimbonakalo

I-4H/6H-P Uhlobo lwe-SiC Composite Substrates Itheyibhile yepharamitha eqhelekileyo

6 ububanzi be-intshi ye-Silicon Carbide (SiC) Substrate Inkcazo

Ibanga Imveliso ye-MPD engekhoyoIbanga (Z) Ibanga) Imveliso EsemgangathweniIbanga (P) Ibanga) Ibanga elingeyonyani (D Ibanga)
Ububanzi 145.5 mm~150.0 mm
Ubukhulu 350 μm ± 25 μm
Uqeqesho lweWafer -Offi-axis: 2.0°-4.0°ukuya ku-[1120] ± 0.5° kwi-4H/6H-P, Kwi-axis:〈111〉± 0.5° kwi-3C-N
Uxinano lweeMipayipi ezincinci 0 cm-2
Ukuxhathisa uhlobo lwe-p 4H/6H-P ≤0.1 Ωꞏcm ≤0.3 Ωꞏcm
uhlobo lwe-n 3C-N ≤0.8 mΩꞏcm ≤1 m Ωꞏcm
Uqhelaniso oluPhambili oluSicaba 4H/6H-P -{1010} ± 5.0°
3C-N -{110} ± 5.0°
Ubude obuPhambili obuSicaba 32.5 mm ± 2.0 mm
Ubude obuSicaba beSibini 18.0 mm ± 2.0 mm
Ulwazelelelo lweSibini oluSicaba I-silicon ijonge phezulu: 90° CW. ukusuka kwiPrime flat ± 5.0°
Ukukhutshwa komda 3 mm 6 mm
I-LTV/TTV/Isaphetha/I-Warp ≤2.5 μm/≤5 μm/≤15 μm/≤30 μm ≤10 μm/≤15 μm/≤25 μm/≤40 μm
Uburhabaxa I-Polish Ra≤1 nm
I-CMP Ra≤0.2 nm I-Ra≤0.5 nm
Iimfanta zoMphetho ngokukhanya okuphezulu Akukho nanye Ubude obuqokelelweyo ≤ 10 mm, ubude obunye ≤2 mm
Iipleyiti zeHex Ngokukhanya Okuphezulu Kobungqingqwa Indawo eqokelelweyo ≤0.05% Indawo eqokelelweyo ≤0.1%
Iindawo zePolytype Ngokukhanya Okuphezulu Akukho nanye Indawo eqokelelweyo≤3%
Izinto ezibandakanyiweyo zeCarbon ezibonakalayo Indawo eqokelelweyo ≤0.05% Indawo eqokelelweyo ≤3%
Imikrwelo yomphezulu weSilicone Ngokukhanya Okuphezulu Akukho nanye Ubude obuqokelelweyo ≤1 × ububanzi besitya esisicaba
Iitships zomphetho eziphezulu ngokukhanya okunamandla Akukho kuvunyelweyo ububanzi nobunzulu obuyi-≥0.2mm 5 zivumelekile, ≤1 mm nganye
Ukungcoliswa komphezulu weSilicon Ngumandla aphezulu Akukho nanye
Ukupakisha Ikhasethi yeewafer ezininzi okanye isitya sewafer esinye

Amanqaku:

※ Imida yeziphene isebenza kumphezulu we-wafer yonke ngaphandle kwendawo engabandakanyiyo umphetho. # Imikrwelo kufuneka ijongwe ebusweni be-Si o

I-wafer ye-SiC ye-4H/6H-P ene-intshi ezi-6 ene-Zero MPD grade kunye ne-production okanye i-dummy grade isetyenziswa kakhulu kwizicelo ze-elektroniki eziphambili. Ukuqhuba kwayo okugqwesileyo kobushushu, i-voltage ephezulu yokuqhekeka, kunye nokumelana neendawo ezinzima kwenza ukuba ilungele izixhobo ze-elektroniki zamandla, ezifana neeswitshi ze-voltage ephezulu kunye nee-inverters. I-Zero MPD grade iqinisekisa iziphene ezincinci, ezibalulekileyo kwizixhobo ezithembekileyo kakhulu. Ii-wafers ze-production grade zisetyenziswa kwimveliso enkulu yezixhobo zamandla kunye nezicelo ze-RF, apho ukusebenza kunye nokuchaneka kubalulekile. Ii-wafers ze-dummy grade, kwelinye icala, zisetyenziselwa ukulinganisa inkqubo, ukuvavanya izixhobo, kunye ne-prototyping, okuvumela ulawulo lomgangatho oluhambelanayo kwiindawo zemveliso ye-semiconductor.

Iingenelo ze-substrates ze-N-type SiC ezidityanisiweyo ziquka

  • Ukuqhuba okuphezulu kobushushu: I-wafer ye-4H/6H-P SiC isusa ubushushu ngokufanelekileyo, nto leyo eyenza ukuba ifaneleke ukusetyenziswa kwe-elektroniki kubushushu obuphezulu kunye namandla aphezulu.
  • I-Voltage ephezulu yokuphazamiseka: Ukukwazi kwayo ukusingatha ii-voltage eziphezulu ngaphandle kokusilela kwenza ukuba ilungele ukusetyenziswa kwe-elektroniki yamandla kunye nezicelo zokutshintsha ii-voltage eziphezulu.
  • Ibanga le-Zero MPD (Micro Pipe Defect): Uxinano oluncinci lweziphene luqinisekisa ukuthembeka okuphezulu kunye nokusebenza, nto leyo ebalulekileyo kwizixhobo ze-elektroniki ezifuna kakhulu.
  • Inqanaba leMveliso yoMveliso oMkhulu: Ifanelekile kwimveliso enkulu yezixhobo ze-semiconductor ezisebenza kakuhle ezinemigangatho engqongqo yomgangatho.
  • Ibanga eliyiDummy loVavanyo kunye noLungiso: Ivumela ukwenziwa ngcono kwenkqubo, ukuvavanywa kwezixhobo, kunye nomzekelo ngaphandle kokusebenzisa ii-wafers ezibiza kakhulu.

Lilonke, ii-wafers ze-SiC ze-4H/6H-P ezine-intshi ezi-6 ezine-Zero MPD grade, i-grade yemveliso, kunye ne-dummy grade zibonelela ngeenzuzo ezibalulekileyo kuphuhliso lwezixhobo ze-elektroniki ezisebenza kakuhle. Ezi wafers ziluncedo kakhulu kwizicelo ezifuna ukusebenza kubushushu obuphezulu, uxinano lwamandla aphezulu, kunye nokuguqulwa kwamandla okusebenzayo. I-Zero MPD grade iqinisekisa iziphene ezincinci ekusebenzeni okuthembekileyo nokuzinzileyo kwesixhobo, ngelixa ii-wafers ze-production grade zixhasa ukwenziwa okukhulu ngolawulo olungqongqo lomgangatho. Ii-wafers ze-dummy grade zibonelela ngesisombululo esingabizi kakhulu sokwenza ngcono inkqubo kunye nokulinganiswa kwezixhobo, okwenza zibe yinto ebalulekileyo ekwenzeni i-semiconductor echanekileyo kakhulu.

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