I-intshi ezi-2 ezingama-50.8mm zeSapphire Wafer C-Plane M-plane R-plane A-plane Ubukhulu 350um 430um 500um

Inkcazo emfutshane:

I-Sapphire yinto edityaniswe ngokukodwa ziimpawu zomzimba, iikhemikhali kunye nezokukhanya, ezenza ukuba imelane nobushushu obuphezulu, ukutshayiswa bubushushu, ukukhukuliseka kwamanzi kunye nesanti, kunye nokukrweleka.


Iimbonakalo

Inkcazo yeendlela ezahlukeneyo zokujonga izinto

Ukuqhelaniswa

I-C(0001)-Axis

I-R(1-102)-Axis

I-M(10-10) -I-Axis

I-A(11-20)-Axis

Ipropati ebonakalayo

I-C axis inokukhanya kwekristale, kwaye ezinye ii-axes zinokukhanya okungalunganga. IPlane C ithe tyaba, kungcono ukuba inqunyulwe.

I-R-plane inzima kancinci kune-A.

I-M plane inezikhonkwane ezinyathelweyo, akulula ukuyisika, kulula ukuyisika. Ubunzima be-A-plane buphezulu kakhulu kunobo be-C-plane, obubonakala ngokuxhathisa ukuguguleka, ukumelana nokukrwela kunye nobunzima obuphezulu; Icala le-A-plane liyiplane egobileyo, elula ukuyisika;
Izicelo

Ii-substrates ze-sapphire ezisekwe kwi-C zisetyenziselwa ukukhulisa iifilimu ezifakwe kwi-III-V kunye ne-II-VI, ezifana ne-gallium nitride, ezinokuvelisa iimveliso ze-LED eziluhlaza okwesibhakabhaka, ii-laser diodes, kunye nezicelo ze-infrared detector.
Oku kungenxa yokuba inkqubo yokukhula kwekristale yesafire ecaleni kwe-C-axis ivuthiwe, ixabiso liphantsi kakhulu, iipropati zomzimba nezekhemikhali zizinzile, kwaye itekhnoloji ye-epitaxy kwi-C-plane ivuthiwe kwaye izinzile.

Ukukhula kwe-substrate esekwe kwi-R ye-silicon extrasystals ezahlukeneyo ezigciniweyo, ezisetyenziswa kwiisekethe ezidibeneyo ze-microelectronics.
Ukongeza, iisekethe ezidityanisiweyo ezinesantya esiphezulu kunye neesensa zoxinzelelo nazo zinokwenziwa kwinkqubo yokuveliswa kwefilimu yokukhula kwe-epitaxial silicon. I-substrate yohlobo lwe-R ingasetyenziswa nakwimveliso ye-lead, ezinye izinto eziqhuba i-superconducting, ii-resistor ezixhathisayo eziphezulu, i-gallium arsenide.

Isetyenziswa kakhulu ekukhuliseni iifilimu ze-epitaxial ze-GaN ezingezizo i-polar/semi-polar ukuphucula ukusebenza kakuhle kokukhanya. I-A-oriented to the substrate ivelisa i-permittivity/medium efanayo, kwaye i-insulation ephezulu isetyenziswa kwi-hybrid microelectronics technology. Ii-superconductors zobushushu obuphezulu zinokuveliswa kwiikristale ezinde ze-A-base.
Umthamo wokucubungula I-Pattern Sapphire Substrate (PSS): Ngendlela yokukhula okanye ukuQokelela, iipateni ze-microstructure eziqhelekileyo ze-nanoscale ziyilwe kwaye zenziwe kwi-substrate ye-sapphire ukulawula uhlobo lokukhanya kwe-LED, kunye nokunciphisa iziphene ezahlukeneyo phakathi kwe-GaN ekhula kwi-substrate ye-sapphire, ukuphucula umgangatho we-epitaxy, kunye nokuphucula ukusebenza kakuhle kwe-quantum ye-LED kunye nokwandisa ukusebenza kakuhle kokukhupha ukukhanya.
Ukongeza, i-sapphire prism, isibuko, ilensi, umngxuma, ikhowuni kunye nezinye iindawo zesakhiwo zinokwenziwa ngokwezifiso ngokweemfuno zabathengi.

Isibhengezo sepropati

Uxinano Ukuqina indawo yokunyibilika Isalathisi sokubonisa ukukhanya (esibonakalayo nesingabonakaliyo) Uthumelo (i-DSP) I-Dielectric constant
3.98g/cm3 9(iinyanga) 2053℃ 1.762~1.770 ≥85% 11.58@300K kwi-C axis(9.4 kwi-A axis)

Umzobo oneenkcukacha

i-avcasvb (1)
i-avcasvb (2)
i-avcasvb (3)

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