I-HPSI SiCOI wafer eyi-4 6inch Hydropholic Bonding
Isishwankathelo seempawu zeSiCOI Wafer (Silicon Carbide-on-Insulator)
Ii-wafer ze-SiCOI zizixhobo zesizukulwana esitsha ze-semiconductor ezidibanisa i-Silicon Carbide (SiC) kunye nomaleko wokukhusela, odla ngokuba yi-SiO₂ okanye i-sapphire, ukuphucula ukusebenza kwi-electronics yamandla, i-RF, kunye ne-photonics. Apha ngezantsi kukho isishwankathelo esineenkcukacha seempawu zazo ezihlulwe ngokwamacandelo aphambili:
| Ipropati | Inkcazo |
| Ukwakhiwa kwezinto | Umaleko weSilicon Carbide (SiC) obotshelelwe kwi-substrate yokukhusela (ngesiqhelo iSiO₂ okanye iSapphire) |
| Ulwakhiwo lwekristale | Ngokwesiqhelo iipolytypes ze-SiC ze-4H okanye ze-6H, ezaziwa ngomgangatho ophezulu wekristale kunye nokufana |
| Iipropati zoMbane | Intsimi yombane ephukileyo kakhulu (~3 MV/cm), i-bandgap ebanzi (~3.26 eV ye-4H-SiC), umsinga ovuzayo ophantsi |
| Ukuqhuba kweThermal | Ukuqhuba okuphezulu kobushushu (~300 W/m·K), okuvumela ukusasazwa kobushushu okusebenzayo |
| Umaleko weDielectric | Umaleko wokuvala umbane (i-SiO₂ okanye i-sapphire) ubonelela ngokwahlulwa kombane kwaye unciphisa amandla e-parasitic |
| Iipropati zoomatshini | Ubunzima obuphezulu (~9 Mohs scale), amandla abalaseleyo oomatshini, kunye nokuzinza kobushushu |
| Umphezulu wokugqiba | Ngokwesiqhelo igudileyo kakhulu kwaye inobunzima obuphantsi, ifanelekile ekwenziweni kwesixhobo |
| Izicelo | Izixhobo ze-elektroniki zamandla, izixhobo ze-MEMS, izixhobo ze-RF, izinzwa ezifuna ukunyamezelana nobushushu obuphezulu kunye ne-voltage |
Ii-wafer ze-SiCOI (iSilicon Carbide-on-Insulator) zimele isakhiwo se-semiconductor substrate esiphucukileyo, esenziwe ngumaleko obhityileyo we-silicon carbide (SiC) osemgangathweni ophezulu obotshelelwe kumaleko ogqumayo, ngesiqhelo i-silicon dioxide (SiO₂) okanye i-sapphire. I-Silicon carbide yi-semiconductor ebanzi eyaziwa ngokukwazi kwayo ukumelana nee-voltage eziphezulu kunye namaqondo obushushu aphezulu, kunye nokuqhuba kakuhle kobushushu kunye nobunzima obuphezulu boomatshini, okwenza ukuba ilungele ukusetyenziswa kwe-elektroniki okunamandla aphezulu, okuphindaphindwayo, kunye nobushushu obuphezulu.
Umaleko wokukhusela kwii-wafers zeSiCOI ubonelela ngokwahlukana kombane okusebenzayo, kunciphisa kakhulu amandla e-parasitic kunye nemisinga yokuvuza phakathi kwezixhobo, ngaloo ndlela kuphucula ukusebenza kwesixhobo kunye nokuthembeka kwaso. Umphezulu we-wafer ucoliwe ngokuchanekileyo ukuze ufumane ukugudiswa okukhulu kunye neziphene ezincinci, ukuhlangabezana neemfuno ezingqongqo zokwenza izixhobo ezincinci nezincinci.
Olu lwakhiwo lwezinto aluphuculi nje kuphela iimpawu zombane zezixhobo zeSiC kodwa lukwaphucula kakhulu ulawulo lobushushu kunye nokuzinza koomatshini. Ngenxa yoko, ii-wafer zeSiCOI zisetyenziswa kakhulu kwii-electronics zamandla, izinto zerediyo (RF), ii-sensors zeenkqubo ze-microelectromechanical (MEMS), kunye nee-electronics zobushushu obuphezulu. Ngokubanzi, ii-wafer zeSiCOI zidibanisa iipropati zomzimba ezibalaseleyo ze-silicon carbide kunye neenzuzo zokwahlulwa kombane zomaleko we-insulator, zibonelela ngesiseko esifanelekileyo kwisizukulwana esilandelayo sezixhobo ze-semiconductor ezisebenza kakhulu.
Isicelo se-SiCOI wafer
Izixhobo ze-Elektroniki zamandla
Iiswitshi ze-voltage ephezulu kunye namandla aphezulu, ii-MOSFET, kunye nee-diode
Zuza kwi-bandgap ebanzi yeSiC, i-voltage ephezulu yokuqhekeka, kunye nozinzo lobushushu
Ukuncipha kokulahleka kwamandla kunye nokusebenza kakuhle kwiinkqubo zokuguqula amandla
Izixhobo zeRadio Frequency (RF)
Ii-transistors kunye nee-amplifier ezisebenza rhoqo
Umthamo ophantsi we-parasitic ngenxa yomaleko wokugquma uphucula ukusebenza kwe-RF
Ifanelekile kwiinkqubo zonxibelelwano ze-5G kunye ne-radar
Iinkqubo zeMicroelectromechanical (MEMS)
Izinzwa kunye nee-actuators ezisebenza kwiindawo ezinzima
Ukuqina koomatshini kunye nokungangeni kweekhemikhali kwandisa ubomi besixhobo
Ibandakanya ii-sensors zoxinzelelo, ii-accelerometers, kunye nee-gyroscopes
Izixhobo ze-elektroniki ezishushu kakhulu
Izixhobo ze-elektroniki zeemoto, i-aerospace, kunye nezicelo zemizi-mveliso
Sebenza ngokuthembekileyo kumaqondo obushushu aphezulu apho i-silicon ingaphumeleli khona
Izixhobo zeFotonic
Ukuhlanganiswa kwezinto ze-optoelectronic kwi-insulator substrates
Ivumela i-on-chip photonics ngolawulo oluphuculweyo lobushushu
Imibuzo neempendulo zeSiCOI wafer
Umbuzo:yintoni i-SiCOI wafer
A:I-SiCOI wafer imele i-Silicon Carbide-on-Insulator wafer. Luhlobo lwe-semiconductor substrate apho umaleko omncinci we-silicon carbide (SiC) ubotshelelwa kumaleko okhuselayo, ngesiqhelo i-silicon dioxide (SiO₂) okanye ngamanye amaxesha i-sapphire. Olu lwakhiwo lufana ngokwengcamango nee-Silicon-on-Insulator (SOI) wafers ezaziwayo kodwa zisebenzisa i-SiC endaweni ye-silicon.
Umfanekiso









