I-Bionic non-slip pad wafer ephethe i-vacuum sucker i-friction pad sucker
Iimpawu zephedi ye-Bionic anti-slip:
• Ukusetyenziswa kwezinto ezikhethekileyo zobunjineli ze-elastomer ezidityanisiweyo, ukuze kungabikho ntsalela, isiphumo esicocekileyo sokulwa nokutyibilika ngaphandle kongcoliseko, esifanelekileyo kwiimfuno zokusingqongileyo kokwenziwa kwe-semiconductor.
• Ngokusebenzisa uyilo oluchanekileyo lwe-micro-nano structure array, ulawulo olukrelekrele lweempawu zokungqubana komphezulu, ngelixa kugcinwa i-coefficient ephezulu yokungqubana ngelixa kufikelela ekunamatheleni okuphantsi kakhulu.
• Uyilo olulodwa lwe-interface mechanics lwenza kube lula ukusebenza kakuhle kokungqubana okuphezulu kwe-tangential (μ>2.5) kunye nokunamathela okuphantsi okuqhelekileyo (<0.1N/cm²).
• Izixhobo zePolymer ezenzelwe ngokukodwa ishishini le-semiconductor, ezifikelela ekusebenzeni okuzinzileyo ngaphandle kokunciphisa ukusetyenziswa kwakhona kwe-100,000 ngokusebenzisa itekhnoloji yokuvelisa i-micro kunye ne-nano.
Ukusetyenziswa kwephedi yokuthintela ukutyibilika yeBionic:
(1) Ishishini le-semiconductor
1. Ukwenziwa kweWafer:
· Ukungatyibiliki xa kudluliswa ii-wafers ezincinci kakhulu ukuya kuthi ga kwi-12 intshi (50-300μm)
· Ukulungiswa ngokuchanekileyo kwesixhobo sokuthwala i-wafer somatshini we-lithography
· I-wafer engatyibilikiyo yezixhobo zokuvavanya
2. Uvavanyo lwephakheji:
· Ukulungiswa okungatshabalalisiyo kwezixhobo zamandla ze-silicon carbide/gallium nitride
· I-anti-slip buffer ngexesha lokufakelwa kwe-chip
· Vavanya ukuxhathisa komothuko nokutyibilika kwetafile yeprobe
(2) Ishishini le-Photovoltaic
1. Ukulungiswa kwe-silicon wafer:
· Ukungatyibiliki ngexesha lokusika intonga ye-silicon e-monocrystalline
· I-wafer ye-silicon encinci kakhulu (<150μm) engatyibilikiyo
· Ukubekwa kwe-silicon wafer yomatshini wokuprinta isikrini
2. Indibano yecandelo:
· Iplani yeglasi engatyibilikiyo ene-laminated
· Indawo yokufaka isakhelo
· Ibhokisi yokubopha ilungisiwe
(3) ishishini le-photoelectric
1. Iphaneli yokubonisa:
· Inkqubo ye-substrate yeglasi ye-OLED/LCD engatyibilikiyo
· Indawo echanekileyo yokulingana kwe-polarizer
· Izixhobo zokuvavanya ezithintela ukutshayisa kunye nezithintela ukutyibilika
2. Izixhobo ezibonakalayo:
· Ukuhlanganiswa kwemodyuli yelensi akutyibiliki
· Ukulungiswa kwePrism/isipili
· Inkqubo ye-laser optical engashukumiyo
(4) Izixhobo ezichanekileyo
1. Iqonga elichanekileyo lomatshini we-lithography alityibiliki
2. Itafile yokulinganisa yezixhobo zokuchonga ayithinteli ukungoyiki
3. Izixhobo ezizenzekelayo zingatyibiliki ingalo yoomatshini
Idatha yobugcisa:
| Ukwakhiwa kwezinto: | C, O, Si |
| Ubunzima bonxweme (A): | 50~55 |
| I-coefficient yokubuyisela i-elastic: | 1.28 |
| Ubushushu bokunyamezelana obuphezulu: | 260℃ |
| I-coefficient yokungqubana: | 1.8 |
| Ukumelana ne-PLASMA: | Ukunyamezelana |
Iinkonzo ze-XKH:
I-XKH ibonelela ngeenkonzo ze-bionic anti-slip mat ezisebenza ngokwenkqubo epheleleyo, kubandakanya uhlalutyo lwemfuno, uyilo lweskimu, ukuqinisekiswa ngokukhawuleza kunye nenkxaso yemveliso enkulu. Ixhomekeke kubuchwepheshe bokuvelisa obuncinci kunye nobombane, i-XKH ibonelela ngezisombululo zobungcali zokulwa-slip kwimizi-mveliso ye-semiconductor, i-photovoltaic kunye ne-photoelectric, kwaye incede abathengi ngempumelelo ukuba bafikelele kwiziphumo ezibalulekileyo ezifana nokunciphisa izinga lenkunkuma ukuya kwi-0.005% kunye nokunyuka kwesivuno nge-15%.
Umzobo oneenkcukacha









