3inch Ucoceko oluphezulu lweSemi-Insulating (HPSI) SiC wafer 350um Dummy ibakala Prime

Inkcazelo emfutshane:

I-HPSI (i-High-Purity Silicon Carbide) ye-SiC wafer, ene-3-intshi yedayamitha kunye nobukhulu obuyi-350 µm ± 25 µm, yenzelwe usetyenziso lwamandla ombane. Ii-wafers ze-SiC zaziwa ngeepropathi zazo zemathiriyeli ezikhethekileyo, ezinje nge-thermal conductivity ephezulu, ukunganyangeki kwamandla ombane aphezulu, kunye nokulahleka kwamandla okuncinci, nto leyo ezenza zibe lukhetho olukhethwayo lwezixhobo zesemiconductor yamandla. La mawafa enzelwe ukujongana neemeko ezigqithisileyo, enikezela ukusebenza okuphuculweyo kwi-high-frequency, high-voltage, kunye nemo yobushushu obuphezulu, lonke eli xesha liqinisekisa ukusebenza kakuhle kwamandla kunye nokuqina.


Iinkcukacha zeMveliso

Iithegi zeMveliso

Isicelo

Ii-wafers ze-HPSI SiC zibalulekile ekwenzeni izixhobo zombane zesizukulwana esilandelayo, ezisetyenziswa kwiintlobo ngeentlobo zezicelo ezisebenza kakhulu:
IiNkqubo zokuGuqulwa koMbane: Ii-wafers ze-SiC zisebenza njengezona zinto ziphambili kwizixhobo zombane ezifana nee-MOSFETs zamandla, ii-diode, kunye nee-IGBT, ezibaluleke kakhulu kuguqulo lwamandla olusebenzayo kwiisekethe zombane. Ezi zixhobo zifumaneka kwizixhobo zombane eziphezulu, iimoto zokuqhuba, kunye nee-inverters zamashishini.

Izithuthi zoMbane (EVs):Imfuno ekhulayo yezithuthi zombane ifuna ukusetyenziswa kwamandla ombane asebenzayo, kwaye ii-wafers ze-SiC zihamba phambili kolu tshintsho. Kwi-EV powertrains, ezi ziqwenga zibonelela ngobuchule obuphezulu kunye namandla okutshintsha ngokukhawuleza, okunegalelo kumaxesha okutshaja okukhawulezayo, uluhlu olude, kunye nokuphucula ukusebenza kwesithuthi siphela.

Umoya ovuselelekayo:Kwiinkqubo zamandla ahlaziyekayo ezifana namandla elanga kunye nomoya, ii-wafers ze-SiC zisetyenziswa kwii-inverters kunye neziguquli ezenza ukuba kubanjwe amandla angaphezulu kunye nokusabalalisa. I-conductivity ephezulu ye-thermal kunye ne-voltage ephezulu yokuphuka kwe-SiC iqinisekisa ukuba ezi nkqubo zisebenza ngokuthembekileyo, naphantsi kweemeko ezinzulu zokusingqongileyo.

Ukuzenzekela kwimizi-mveliso kunye neRobhothi:Amandla ombane asebenza kakhulu kwiinkqubo ezizisebenzelayo zoshishino kunye neerobhothi zifuna izixhobo ezikwaziyo ukutshintsha ngokukhawuleza, ukuphatha imithwalo yamandla amakhulu, nokusebenza phantsi koxinzelelo oluphezulu. I-SiC-based semiconductors ihlangabezana nezi mfuno ngokubonelela ngokusebenza okuphezulu kunye nokomelela, nakwiindawo zokusebenza ezinzima.

IiNkqubo zoNxibelelwano:Kwiziseko zonxibelelwano lomnxeba, apho ukuthembeka okuphezulu kunye nokuguqulwa kwamandla okusebenzayo kubaluleke kakhulu, ii-wafers ze-SiC zisetyenziselwa umbane kunye nabaguquli be-DC-DC. Izixhobo ze-SiC zinceda ukunciphisa ukusetyenziswa kwamandla kunye nokuphucula ukusebenza kwenkqubo kumaziko edatha kunye nothungelwano lonxibelelwano.

Ngokubonelela ngesiseko esomeleleyo sezicelo zamandla aphezulu, i-HPSI SiC wafer yenza uphuhliso lwezixhobo ezisebenza ngamandla, ukunceda amashishini atshintshe kwi-greener, izisombululo ezizinzileyo.

Iipropati

umsebenzi

IBanga leMveliso

IBanga loPhando

IBanga leDummy

Ububanzi 75.0 mm ± 0.5 mm 75.0 mm ± 0.5 mm 75.0 mm ± 0.5 mm
Ukutyeba 350 µm ± 25 µm 350 µm ± 25 µm 350 µm ± 25 µm
Iwafer Orientation Kwi-axis: <0001> ± 0.5 ° Kwi-axis: <0001> ± 2.0 ° Kwi-axis: <0001> ± 2.0 °
Uxinaniso lweMibhobho ye-95% yeeWafers (MPD) ≤ 1 cm⁻² ≤ 5 cm⁻² ≤ 15 cm⁻²
Ukuxhathisa koMbane ≥ 1E7 Ω·cm ≥ 1E6 Ω·cm ≥ 1E5 Ω·cm
I-Dopant Ingaguqulwanga Ingaguqulwanga Ingaguqulwanga
Ukuqhelaniswa neFlethi okuPhambili {11-20} ± 5.0° {11-20} ± 5.0° {11-20} ± 5.0°
Ubude beFlethi obuPhambili 32.5 mm ± 3.0 mm 32.5 mm ± 3.0 mm 32.5 mm ± 3.0 mm
Ubude beFlethi yesibini 18.0 mm ± 2.0 mm 18.0 mm ± 2.0 mm 18.0 mm ± 2.0 mm
Ukuqhelaniswa neFlethi yesibini Si jonga phezulu: 90° CW ukusuka kwiflethi yokuqala ± 5.0° Si jonga phezulu: 90° CW ukusuka kwiflethi yokuqala ± 5.0° Si jonga phezulu: 90° CW ukusuka kwiflethi yokuqala ± 5.0°
Ukungabandakanywa kuMda 3 mm 3 mm 3 mm
LTV/TTV/Bow/Warp 3 µm / 10 µm / ±30 µm / 40 µm 3 µm / 10 µm / ±30 µm / 40 µm 5 µm / 15 µm / ±40 µm / 45 µm
Uburhabaxa boMphezulu Ubuso be-C: bukhazimlisiwe, ubuso beSi: CMP Ubuso be-C: bukhazimlisiwe, ubuso beSi: CMP Ubuso be-C: bukhazimlisiwe, ubuso beSi: CMP
Iintanda (zihlolwe ngokukhanya okuphezulu) Akukho nanye Akukho nanye Akukho nanye
Iipleyiti zeHex (zihlolwe ngokukhanya okuphezulu) Akukho nanye Akukho nanye Indawo eyongezelekayo 10%
Iindawo zePolytype (zihlolwe ngokukhanya okuphezulu) Indawo eyongezelekayo 5% Indawo eyongezelekayo 5% Indawo eyongezelekayo 10%
Imikrwelo (ihlolwe sisibane sokukhanya okuphezulu) ≤ Imikrwelo emi-5, ubude obuninzi ≤ 150 mm ≤ Imikrwelo eyi-10, ubude obuninzi ≤ 200 mm ≤ Imikrwelo eyi-10, ubude obuninzi ≤ 200 mm
Edge Chipping Akukho kuvunyelweyo ≥ 0.5 mm ububanzi nobunzulu I-2 ivunyelwe, ≤ 1 mm ububanzi kunye nobunzulu I-5 ivunyelwe, ≤ 5 mm ububanzi kunye nobunzulu
Ungcoliseko loMphezulu (uhlolwe sisibane sobukhulu obuphezulu) Akukho nanye Akukho nanye Akukho nanye

 

Izinto Eziluncedo Ezingundoqo

Ukusebenza okuphezulu kwe-Thermal: I-SiC ephezulu ye-thermal conductivity iqinisekisa ukutshatyalaliswa kobushushu ngokufanelekileyo kwizixhobo zamandla, ezivumela ukuba zisebenze kumanqanaba aphezulu ombane kunye namaza ngaphandle kokushisa. Oku kuguqulela kwiinkqubo ezincinci, ezisebenzayo kunye nexesha elide lokusebenza.

I-Voltage ye-High Breakdown Voltage: Nge-bandgap ebanzi xa kuthelekiswa ne-silicon, ii-wafers ze-SiC zixhasa usetyenziso lwe-voltage ephezulu, ezenza zilungele izixhobo zombane ze-elektroniki ezifuna ukuxhathisa amandla ombane aphezulu, njengakwizithuthi zombane, iinkqubo zamandla egridi, kunye neenkqubo zamandla avuselelekayo.

UkuNcitshiswa koLahleko lwaMandla: Ukunganyangeki okuphantsi kunye nesantya sokutshintsha ngokukhawuleza kwezixhobo ze-SiC kubangela ukunciphisa ukulahlekelwa kwamandla ngexesha lokusebenza. Oku akuphuculi nje ukusebenza ngokufanelekileyo kodwa konyusa ukonga umbane ngokubanzi kwiinkqubo apho zisiwe khona.
Ukunyaniseka okuphuculweyo kwiiNdawo eziNgqongileyo: Iipropati zezinto eziphathekayo ze-SiC zivumela ukuba zenze kwiimeko ezinzima, ezifana nokushisa okuphezulu (ukuya kwi-600 ° C), i-voltage ephezulu, kunye nee-frequencies eziphezulu. Oku kwenza ukuba ii-wafers ze-SiC zilungele ukufunwa kwemizi-mveliso, iimoto, kunye nokusetyenziswa kwamandla.

UkuSebenza kwamandla: Izixhobo ze-SiC zibonelela ngoxinano lwamandla aphezulu kunezixhobo ze-silicon zemveli, ukunciphisa ubungakanani kunye nobunzima beenkqubo zombane zamandla ngelixa ziphucula ukusebenza kwazo zonke. Oku kukhokelela ekongiweni kweendleko kunye nokuncinci kokusingqongileyo kwizicelo ezifana namandla ahlaziyekayo kunye nezithuthi zombane.

I-Scalability: I-3-intshi ye-diameter kunye nokunyamezela kwemveliso echanekileyo ye-HPSI SiC wafer iqinisekisa ukuba i-scalable yemveliso yobuninzi, ihlangabezana neemfuno zophando kunye neemveliso zorhwebo.

Ukuqukumbela

I-wafer ye-HPSI SiC, ne-3-intshi yedayamitha yayo kunye ne-350 µm ± 25 µm ubukhulu, sesona sixhobo sifanelekileyo kwisizukulwana esilandelayo sezixhobo zombane ezisebenza ngamandla aphezulu. Ukudityaniswa kwayo okukhethekileyo kokusebenza kwe-thermal, i-voltage ephezulu yokuqhekeka, ukulahleka kwamandla aphantsi, kunye nokuthembeka phantsi kweemeko ezigqithisileyo kuyenza ibe yinxalenye ebalulekileyo yezicelo ezahlukeneyo zokuguqulwa kwamandla, amandla avuselelekayo, izithuthi zombane, iinkqubo zoshishino kunye nonxibelelwano.

Le wafer ye-SiC ifaneleke ngokukodwa kumashishini afuna ukufikelela kwimpumelelo ephezulu, ukonga amandla amakhulu, kunye nokuphucula ukuthembeka kwenkqubo. Njengoko iteknoloji ye-electronics yamandla iqhubeka nokuguquka, i-HPSI SiC wafer ibonelela ngesiseko sophuhliso lwesizukulwana esilandelayo, izisombululo ezisebenza ngamandla, ukuqhuba utshintsho kwikamva elizinzileyo, eliphantsi kwekhabhoni.

Idayagram eneenkcukacha

3INCH HPSI SIC WAFER 01
3INCH HPSI SIC WAFER 03
3INCH HPSI SIC WAFER 02
3INCH HPSI SIC WAFER 04

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