Iimveliso
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I-AlN kwi-FSS 2inch 4inch NPSS/FSS Itemplate ye-AlN yendawo ye-semiconductor
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I-Gallium Nitride (GaN) Epitaxial ekhuliswe kwiiWafers zeSapphire eziyi-4 intshi eziyi-6 intshi ze-MEMS
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I-Gallium Nitride kwi-Silicon wafer 4inch 6inch Ulungelelwaniso lwe-Substrate ye-Si, i-Resistivity, kunye neenketho ze-N-type/P-type
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IiWafers ze-GaN-on-SiC Epitaxial ezenzelwe wena (100mm, 150mm) – Iinketho ezininzi zeSiC Substrate (4H-N, HPSI, 4H/6H-P)
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IiWafers zeGaN-on-Diamond 4inch 6inch Ubukhulu be-epi iyonke (micron) 0.6 ~ 2.5 okanye ezenzelwe usetyenziso oluQhelekileyo
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Ibhokisi yokuthwala i-wafer ye-FOSB eneendawo ezingama-25 ze-wafer eyi-12 intshi Isithuba esichanekileyo semisebenzi ezenzekelayo Izixhobo ezicocekileyo kakhulu
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Ibhokisi yokuthumela evulekileyo engaphambili eyi-12 intshi （300mm） Ibhokisi yokuthwala i-wafer ye-FOSB enomthamo we-25pcs wokuphatha nokuthumela i-wafer Imisebenzi ezenzekelayo
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Iilensi ze-Precision Monocrystalline Silicon (Si) – Ubungakanani kunye neeCoatings ezenziwe ngokwezifiso ze-Optoelectronics kunye ne-Infrared Imaging
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Iilensi ze-High-Purity Single Crystal Silicon (Si) ezenziwe ngokwezifiso – Ubungakanani kunye neeCoatings ezilungiselelwe ukusetyenziswa kwe-Infrared kunye ne-THZ (1.2-7µm, 8-12µm)
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Ifestile ye-Optical yeSapphire Step-Type eyenzelwe wena, i-Al2O3 Single Crystal, i-High Purity, i-Diameter 45mm, i-10mm yobukhulu, i-Laser Cut kwaye i-Polished
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Ifestile yeSapphire eSebenza kakuhle kakhulu, iCrystal enye ye-Al2O3, enombala ocacileyo, iiMilo kunye nobukhulu obulungiselelwe wena kwiisicelo ze-Precision Optical
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Iphini yokuphakamisa iSapphire eSebenza ngokuPhezulu, iCrystal enye ye-Al2O3 ecocekileyo yeeNkqubo zoThumelo lweWafer - Ubungakanani obuQhelekileyo, ukuqina okuphezulu kwizicelo ezichanekileyo