IiWafers zeSilicon vs. IiWafers zeglasi: Yintoni Ngokwenene esiyicocayo? Ukusuka kwi-Material Essence ukuya kwiProcess-Based Cleaning Solutions

Nangona zombini ii-silicon kunye ne-glass wafers zabelana nenjongo efanayo "yokucocwa," imiceli mngeni kunye neendlela zokusilela abajongana nazo ngexesha lokucoca zahluke kakhulu. Oku kungafani kuvela kwiimpawu zezinto eziphathekayo kunye neemfuno zokuchazwa kwe-silicon kunye neglasi, kunye "nefilosofi" ecacileyo yokucoca eqhutywa zizicelo zabo zokugqibela.

Okokuqala, makhe sicacise: Yintoni kanye kanye esiyicocayo? Ziziphi izinto ezingcolisayo ezibandakanyekileyo?

Izinto ezingcolisayo zingahlelwa ngokweendidi ezine:

  1. I-Particle Contaminants

    • Uthuli, iincinci zetsimbi, iinqununu zezinto eziphilayo, iinqununu ezinqabileyo (ukusuka kwinkqubo yeCMP), njl.

    • Ezi zingcolisi zingabangela iziphene zepateni, ezifana neefutshane okanye iisekethe ezivulekileyo.

  2. Izingcolisi ze-Organic

    • Ibandakanya iintsalela ze-photoresist, izongezo ze-resin, i-oyile yesikhumba somntu, iintsalela ze-solvent, njl.

    • Ungcoliseko lwe-Organic lunokwenza iimaski ezithintela i-etching okanye i-ion implantation kunye nokunciphisa ukunamathela kwezinye iifilimu ezincinci.

  3. Izingcolisi zeMetal Ion

    • Intsimbi, ubhedu, i-sodium, i-potassium, i-calcium, njl., ephuma kuqala kwizixhobo, iikhemikhali, kunye nokunxibelelana kwabantu.

    • Kwii-semiconductors, i-ion zetsimbi "zii-killer" ezingcolisayo, ezizisa amanqanaba ombane kwi-band enqatshelwe, okwandisa ukuvuza kwangoku, ukunciphisa ixesha lokuphila komthuthi, kunye nokonakalisa kakhulu iipropati zombane. Kwiglasi, zinokuchaphazela umgangatho kunye nokunamathela kwiifilimu ezinqabileyo ezilandelayo.

  4. Uluhlu lweNative oxide

    • Kwiziphaluka zesilicon: Umaleko obhityileyo wesilicon dioxide (Native Oxide) ngokwendalo kwakheka kumphezulu osemoyeni. Ubunzima kunye nokufana kolu luhlu lwe-oxide kunzima ukulawula, kwaye kufuneka lususwe ngokupheleleyo ngexesha lokwenziwa kwezakhiwo eziphambili ezifana nee-oxide zesango.

    • Ngeentsimbi zeglasi: Iglasi ngokwayo sisakhiwo senethiwekhi ye-silica, ngoko ke akukho mcimbi "wokususa umaleko we-oxide wendalo." Nangona kunjalo, umphezulu unokuthi uguqulwe ngenxa yongcoliseko, kwaye olu maleko kufuneka lususwe.

 


I. Iinjongo eziphambili: Ukwahlukana phakathi kokuSebenza koMbane kunye nokuPheliseka koMzimba

  • Iziqwenga zeSilicon

    • Injongo ephambili yokucoca kukuqinisekisa ukusebenza kombane. Iinkcukacha ngokuqhelekileyo ziquka ukubala kwamasuntswana angqongqo kunye nobukhulu (umzekelo, amasuntswana ≥0.1μm kufuneka asuswe ngokufanelekileyo), i-ion concentrations yensimbi (umzekelo, i-Fe, i-Cu kufuneka ilawulwe ukuya kwi-≤10¹⁰ athomu/cm² okanye ngaphantsi), kunye namanqanaba entsalela ye-organic. Nokuba ukungcoliseka kwe-microscopic kunokukhokelela kwiifutshane zesekethe, imisinga yokuvuza, okanye ukungaphumeleli kwengqibelelo ye-oxide yesango.

  • IiWafers zeglasi

    • Njengama-substrates, iimfuno eziphambili kukugqibelela komzimba kunye nokuzinza kweekhemikhali. Iinkcazo zigxininise kwiinkalo ze-macro-level ezifana nokungabikho kwemikrwelo, amabala angenakususwa, kunye nokugcinwa kobuqhetseba bokuqala kunye nejometri. Injongo yokucoca ngokuyinhloko kukuqinisekisa ukucoceka okubonakalayo kunye nokubambelela kakuhle kwiinkqubo ezilandelayo ezifana nokugubungela.


II. Ubume beMaterial: Umahluko osisiseko phakathi kweCrystalline kunye neAmorphous

  • Isilicon

    • I-silicon yi-crystalline material, kwaye umphezulu wayo ngokwemvelo ukhula i-silicon dioxide (i-SiO₂) engalinganiyo yomaleko. Lo mgangatho we-oxide ubeka umngcipheko ekusebenzeni kombane kwaye kufuneka ususwe ngokucokisekileyo nangokulinganayo.

  • Iglasi

    • Iglasi yi-amorphous silica network. Izinto zayo ezininzi zifana nokubunjwa kwe-silicon oxide layer ye-silicon, oku kuthetha ukuba inokufakwa ngokukhawuleza nge-hydrofluoric acid (HF) kwaye iyakwazi ukukhukuliseka okunamandla kwe-alkali, okukhokelela ekwandeni koburhabaxa bomhlaba okanye ukuguqulwa. Lo mahluko usisiseko uyalela ukuba ukucocwa kwe-silicon wafer kunokunyamezela ukukhanya, ukufakwa okulawulwayo ukususa ungcoliseko, ngelixa ukucocwa kwe-wafer yeglasi kufuneka kwenziwe ngononophelo olukhulu ukunqanda ukonakalisa izinto ezisisiseko.

 

Into yokucoca Ukucoca iSilicon Wafer Ukucoca iWafer yeglasi
Ukucoca Injongo Ibandakanya umaleko wayo wendalo oxide Khetha indlela yokucoca: Susa ukungcola ngelixa ukhusela izinto ezisisiseko
Ukucoca okusemgangathweni kwe-RCA - SPM(H₂SO₄/H₂O₂): Susa iintsalela ze-organic/photoresist Ukuhamba okuPhambili kokuCoca:
- SC1(NH₄OH/H₂O₂/H₂O): Susa amasuntswana omphezulu I-ejenti yokucoca i-alkaline ebuthathaka: Iqulethe i-agent surface esebenzayo ukususa ukungcola kwezinto eziphilayo kunye namasuntswana
- I-DHF(I-Hydrofluoric acid): Isusa umaleko we-oxide yendalo kunye nezinye izinto ezingcolisayo I-alkaline eyomeleleyo okanye i-Arhente yokucoca i-alkaline ephakathi: Isetyenziselwa ukususa i-metallic okanye i-non-volatile contaminents
- SC2(HCl/H₂O₂/H₂O): Isusa izinto ezingcolisa isinyithi Kuphephe i-HF kulo lonke
Imichiza engundoqo Iiasidi ezinamandla, ii-alkali ezinamandla, i-solvents oxidizing I-arhente yokucoca i-alkaline ebuthathaka, eyenzelwe ngokukodwa ukususwa kongcoliseko olungephi
Uncedo Lwenyama Amanzi adiyiniweyo (ukuhlamba ucoceko oluphezulu) Ultrasonic, ukuhlamba i-megasonic
Ukomisa iTekhnoloji Megasonic, IPA ukomisa umphunga Ukomisa ngobunono: Ukuphakamisa kancinci, ukomisa umphunga we-IPA

III. Ukuthelekiswa kweZisombululo zokucoca

Ngokusekwe kwiinjongo ezikhankanywe ngasentla kunye neempawu zezinto eziphathekayo, izisombululo zokucoca i-silicon kunye neefestile zeglasi ziyahluka:

Ukucoca iSilicon Wafer Ukucoca iWafer yeglasi
Injongo yokucoca Ukususwa ngokucokisekileyo, kuquka umaleko we-oksidi wendalo wewafer. Ukususwa okukhethiweyo: susa ukungcola ngelixa ukhusela i-substrate.
Inkqubo eqhelekileyo Ucoceko lwe-RCA eqhelekileyo:SPM(H₂SO₄/H₂O₂): isusa izinto eziphilayo ezinzima/i-photoresist •SC1(NH₄OH/H₂O₂/H₂O): ukususwa kwamasuntswana ealkaline •I-DHF(Dilute HF): isusa umaleko weoxide yendalo kunye neentsimbi •SC2(HCl/H₂O₂/H₂O): isusa ioni zetsimbi Uphawu lokucoca ukuhamba:Isicoci se-alkaline esiphakathikunye nezinto zokususa izinto eziphilayo kunye namasuntswana •Isicoci esine-Acidic okanye esingathathi hlangothiyokususa ii-ion zentsimbi kunye nezinye izingcolisi ezithile •Gwema i-HF kuyo yonke inkqubo
Iikhemikhali eziphambili Iiasidi ezinamandla, ii-oxidizers ezinamandla, izisombululo ze-alkaline Abacoci be-alkaline ephakathi; izicoci ezikhethekileyo ezingathathi hlangothi okanye ezineasidi kancinane
Uncedo ngokwasemzimbeni I-Megasonic (ukusebenza okuphezulu, ukususwa kwamasuntswana athambileyo) Ultrasonic, megasonic
Ukomisa ukomisa iMarangoni; IPA ukomiswa komphunga Ukomisa kancinci kancinci; IPA ukomiswa komphunga
  • Inkqubo yokucoca iWafer yeglasi

    • Okwangoku, izityalo ezininzi zeglasi zisebenzisa iinkqubo zokucoca ngokusekelwe kwiimpawu zezinto zeglasi, zithembele ngokukodwa kwii-agent zokucoca i-alkaline ezibuthathaka.

    • Iimpawu zeArhente yokucoca:Ezi arhente zokucoca zikhethekileyo zine-alkaline ebuthathaka, ene-pH ejikeleze i-8-9. Ngokuqhelekileyo ziqulethe i-surfactants (umzekelo, i-alkyl polyoxyethylene ether), i-metal chelating agents (umzekelo, i-HEDP), kunye nezixhobo zokucoca eziphilayo, ezenzelwe ukumisa kunye nokubola ukungcola kwezinto eziphilayo ezifana ne-oyile kunye neminwe yeminwe, ngelixa i-corrosive kancinane kwi-matrix yeglasi.

    • Inkqubo yokuhamba:Inkqubo yokucoca eqhelekileyo ibandakanya ukusebenzisa i-concentration ethile ye-alkaline ebuthathaka yokucoca i-alkaline kwiqondo lokushisa ukusuka kwiqondo lokushisa ukuya kwi-60 ° C, idibene nokucoca i-ultrasonic. Emva kokucoca, iiwafers zithatha amanyathelo amaninzi okuhlamba ngamanzi acocekileyo kunye nokomisa kakuhle (umzekelo, ukuphakamisa okucothayo okanye ukomisa umphunga we-IPA). Le nkqubo ihlangabezana ngokufanelekileyo neemfuno zeglasi yokucoceka okubonakalayo kunye nococeko jikelele.

  • Inkqubo yokucoca iSilicon Wafer

    • Ukusetyenzwa kwe-semiconductor, ii-silicon wafers ngokuqhelekileyo zicocwa ngokwe-RCA esemgangathweni, eyindlela yokucoca esebenzayo kakhulu ekwaziyo ukujongana ngokucwangcisiweyo kuzo zonke iintlobo zongcoliseko, nokuqinisekisa ukuba iimfuno zokusebenza kombane kwizixhobo ze-semiconductor ziyafezekiswa.



IV. Xa iGlass idibana neMigangatho "Yococeko" ePhakamileyo

Xa iiwafers zeglasi zisetyenziswa kwizicelo ezifuna ukubala kwamasuntswana angqongqo kunye namanqanaba e-ion yesinyithi (umzekelo, njenge substrates kwiinkqubo zesemiconductor okanye iindawo ezigqwesileyo zefilimu ezicekethekileyo zokubeka ifilimu), inkqubo yokucoca ngaphakathi inokungasakwazi ukwanela. Kule meko, imigaqo yokucoca i-semiconductor ingasetyenziswa, iqalise isicwangciso esilungisiweyo sokucoca i-RCA.

Undoqo wesi sicwangciso kukungcungcuthekisa kunye nokwandisa umgangatho wenkqubo ye-RCA iparameters ukulungiselela imo ebuthathaka yeglasi:

  • Ukususwa kwezinto ezingcolisayo:Izisombululo ze-SPM okanye amanzi athambileyo e-ozone angasetyenziselwa ukubola ungcoliseko lwe-organic ngokusebenzisa i-oxidation enamandla.

  • Ukususwa kweNcam:Isisombululo se-SC1 esixutywe kakhulu sisetyenziswa kumaqondo obushushu asezantsi kunye namaxesha amafutshane onyango ukusebenzisa i-electrostatic repulsion kunye ne-micro-etching iziphumo zokususa amasuntswana, ngelixa unciphisa ukubola kwiglasi.

  • Ukususwa kwe-Metal ion:Isisombululo se-SC2 esihlanjululweyo okanye i-dilute elula ye-hydrochloric acid / i-dilute nitric acid izisombululo zisetyenziselwa ukususa i-metal contaminants nge-chelation.

  • Izithintelo ezingqongqo:I-DHF (i-di-ammonium fluoride) mayiphetshwe ngokupheleleyo ukuze kuthintelwe ukubola kwenxalenye yeglasi.

Kuyo yonke inkqubo eguquliweyo, ukudibanisa iteknoloji ye-megasonic iphakamisa kakhulu ukususwa kokusebenza kwee-nano-size particles kwaye ithambile phezu komhlaba.


Ukuqukumbela

Iinkqubo zokucoca i-silicon kunye neewafers zeglasi ziziphumo ezingenakuthintelwa zobunjineli obubuyela umva ngokusekwe kwiimfuno zabo zokugqibela zesicelo, iipropathi zezinto eziphathekayo, kunye neempawu zomzimba kunye neekhemikhali. Ukucoca iwafer ye-silicon kufuna "ukucoceka kwinqanaba le-atomic" ekusebenzeni kombane, ngelixa ukucocwa kwe-wafer yeglasi kugxile ekufezekiseni indawo "egqibeleleyo, engonakalanga". Njengoko ii-wafers zeglasi zisanda kusetyenziswa kwizicelo ze-semiconductor, iinkqubo zabo zokucoca ngokuqinisekileyo ziya kuvela ngaphaya kokucocwa kwe-alkaline ebuthathaka, ukuphuhlisa izisombululo ezisulungekileyo, ezilungiselelwe njengenkqubo ye-RCA elungisiweyo ukuhlangabezana nemigangatho ephezulu yokucoceka.


Ixesha lokuposa: Oct-29-2025