I-Wafer Substrates njengeZixhobo eziPhambili kwiSemiconductor Devices
I-Wafer substrates ngabathwali bomzimba bezixhobo ze-semiconductor, kunye neempawu zabo eziphathekayo zichaza ngokuthe ngqo ukusebenza kwesixhobo, iindleko, kunye neendawo zokusetyenziswa. Apha ngezantsi ziintlobo eziphambili ze-wafer substrates kunye nezinto eziluncedo kunye nokungalunganga:
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Ukwabelana kwimakethi:Ibalelwa ngaphezulu kwe-95% yemarike ye-semiconductor yehlabathi.
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Izinto eziluncedo:
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Ixabiso eliphantsi:Izinto ezininzi eziluhlaza (i-silicon dioxide), iinkqubo zokuvelisa ezivuthiweyo, kunye noqoqosho olomeleleyo lwesikali.
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Ukuhambelana kwenkqubo ephezulu:Itekhnoloji yeCMOS ikhule kakhulu, ixhasa iindawo eziphambili (umz., 3nm).
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Umgangatho ogqwesileyo wekristale:Ii-wafers ezinobubanzi obukhulu (ubukhulu be-12-intshi, i-18-intshi phantsi kophuhliso) ezinoxinzelelo oluphantsi lwesiphene zinokukhuliswa.
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Iimpawu ezizinzileyo zoomatshini:Kulula ukusika, ukupolisha, kunye nokuphatha.
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Izinto ezingeloncedo:
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Ibhendi emxinwa (1.12 eV):Ukuvuza okuphezulu ngoku kumaqondo obushushu aphakamileyo, ukunciphisa ukusebenza kwesixhobo samandla.
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Umsantsa ongathanga ngqo:Ukukhutshwa kokukhanya okuphantsi kakhulu, okungafanelekanga kwizixhobo ze-optoelectronic ezifana ne-LED kunye ne-lasers.
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Ukuhamba kwe-electron okulinganiselwe:Ukusebenza okuphantsi kwe-frequency ephezulu xa kuthelekiswa ne-compound semiconductors.

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Usetyenziso:Izixhobo zeRF eziphezulu (i-5G / 6G), izixhobo ze-optoelectronic (i-lasers, iiseli zelanga).
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Izinto eziluncedo:
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Ukuhamba kwe-electron ephezulu (5–6× leyo yesilicon):Ifanelekile kwi-high-speed, izicelo eziphezulu ze-frequency ezifana ne-millimeter-wave communication.
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Ibhendi ethe ngqo (1.42 eV):Ukuguqulwa kwe-photoelectric ephezulu, isiseko se-laser ye-infrared kunye ne-LEDs.
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Ubushushu obuphezulu kunye nokumelana nemitha:Ifanelekile kwi-aerospace kunye neemeko ezingqongileyo ezinzima.
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Izinto ezingeloncedo:
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Iindleko eziphezulu:Izinto ezinqongopheleyo, ukukhula kwekristale okunzima (kukulungele ukuchithwa), ubungakanani obunqamlekileyo be-wafer (ubukhulu be-6-intshi).
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Ubuchwephesha bokukhanda:Ithambekele ekuqhekekeni, okukhokelela kwisivuno esisezantsi sokusetyenzwa.
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Ubutyhefu:I-Arsenic idinga ukuphathwa ngokungqongqo kunye nokulawulwa kwendalo.
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3. I-Silicon Carbide (SiC)
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Usetyenziso:Izixhobo zamandla aphezulu kunye ne-high-voltage (i-EV inverters, izikhululo zokutshaja), i-aerospace.
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Izinto eziluncedo:
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Ibhendi ebanzi (3.26 eV):Amandla aphezulu okuphuka (10 × ye-silicon), ukunyamezela kobushushu obuphezulu (ukushisa okusebenzayo>200 ° C).
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I-thermal conductivity ephezulu (≈3× isilicon):Ukutshatyalaliswa kobushushu okugqwesileyo, okwenza uxinano lwamandla enkqubo ephezulu.
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Ilahleko yokutshintsha okuphantsi:Ukuphucula ukusebenza kokuguqulwa kwamandla.
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Izinto ezingeloncedo:
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Ulucelomngeni lolungiselelo lwesubstrate:Ukukhula okucothayo kwekristale (> 1 iveki), ukulawulwa kwesiphako esinzima (micropipes, dislocations), ixabiso eliphezulu kakhulu (5-10 × silicon).
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Isayizi encinci ye-wafer:Ikakhulu i-4-6 intshi; 8-intshi isaphantsi kophuhliso.
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Kunzima ukuqhubekeka:Kunzima kakhulu (i-Mohs 9.5), ukwenza ukusika kunye nokupholisa ixesha elide.
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4. IGallium Nitride (GaN)
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Usetyenziso:Izixhobo zamandla ezixhaphakileyo (ukutshaja ngokukhawuleza, izikhululo zesiseko ze-5G), ii-LED / lasers eziluhlaza.
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Izinto eziluncedo:
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Ukushukuma kwe-electron ephezulu kakhulu + i-bandap ebanzi (3.4 eV):Idibanisa i-high-frequency (> 100 GHz) kunye nokusebenza okuphezulu kwe-voltage.
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Ukuxhathisa okuphantsi:Yehlisa ilahleko yamandla esixhobo.
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I-Heteroepitaxy iyahambelana:Ngokuqhelekileyo ikhule kwi-silicon, isafire, okanye i-SiC substrates, ukunciphisa iindleko.
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Izinto ezingeloncedo:
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Ukukhula kwekristale enye kunzima:I-Heteroepitaxy yeyona nto iphambili, kodwa ukungafani kwe-lattice kubangela iziphene.
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Iindleko eziphezulu:Ii-substrates ze-Native GaN zibiza kakhulu (i-2-intshi ye-wafer inokubiza amawaka aliqela e-USD).
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Imingeni yokuthembeka:Iziganeko ezinje ngokuwa ngoku zifuna ukwenziwa ngcono.
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5. I-Indium Phosphide (InP)
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Usetyenziso:Unxibelelwano olukhawulezayo lwe-optical (i-lasers, i-photodetectors), izixhobo ze-terahertz.
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Izinto eziluncedo:
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Ukushukuma kwe-electron ephezulu kakhulu:Ixhasa> ukusebenza kwe-100 GHz, ukugqwesa ii-GaAs.
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Ibhendi ethe ngqo enobude obuthelekisekayo:Izinto ezingundoqo ze-1.3-1.55 μm zonxibelelwano lwefiber optical.
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Izinto ezingeloncedo:
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Ibhibhile kwaye ibiza kakhulu:Ixabiso leSubstrate lidlula i-100× isilicon, isayizi esisicaba esilinganiselweyo (i-intshi ezi-4–6).
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6. Isafire (Al₂O₃)
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Usetyenziso:Ukukhanya kwe-LED (i-GaN epitaxial substrate), i-glass ye-electronics cover glass.
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Izinto eziluncedo:
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Ixabiso eliphantsi:Ixabiso eliphantsi kakhulu kune-SiC/GaN substrates.
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Uzinzo lwekhemikhali olugqwesileyo:I-Corrosion-resistant, ikhusela kakhulu.
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Ukungafihli:Ifanelekile kwizakhiwo ze-LED ezithe nkqo.
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Izinto ezingeloncedo:
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Ilathisi enkulu engafaniyo ne-GaN (>13%):Ibangela ingxinano ephezulu yesiphene, ifuna iileya zesithinteli.
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Ukuqhuba kakubi kwe-thermal (~1/20 yesilicon):Inciphisa ukusebenza kwee-LED ezinamandla aphezulu.
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7. Iisubstrates zeCeramic (AlN, BeO, njl.)
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Usetyenziso:Izisasazo zobushushu kwiimodyuli zamandla aphezulu.
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Izinto eziluncedo:
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I-Insulating + high conductivity thermal conductivity (AlN: 170–230 W/m·K):Ifanele ukupakishwa koxinzelelo oluphezulu.
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Izinto ezingeloncedo:
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Ikristale engeyiyo enye:Ayinakuxhasa ngokuthe ngqo ukukhula kwesixhobo, sisetyenziswa kuphela njengezinto ezincinci zokupakisha.
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8. IiSubstrates eziKhethekileyo
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I-SOI (I-Silicon kwi-Insulator):
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Ulwakhiwo:I-silicon / i-SiO₂ / isangweji ye-silicon.
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Izinto eziluncedo:Ukunciphisa i-parasitic capacitance, i-radiation-hardened, ukunyanzeliswa kokuvuza (isetyenziswe kwi-RF, i-MEMS).
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Izinto ezingeloncedo:I-30-50% ibiza kakhulu kune-silicon eninzi.
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I-Quartz (SiO₂):Isetyenziswe kwiifotomasks kunye ne-MEMS; ukumelana nobushushu obuphezulu kodwa brittle kakhulu.
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Idayimani:Eyona substrate ye-thermal conductivity (>2000 W/m·K), phantsi kwe-R&D yokulahla ubushushu obugqithisileyo.
Itheyibhile yokuthelekisa isiShwankathelo
| ISubstrate | I-Bandgap (eV) | Ukushukuma kwe-Electron (cm²/V·s) | I-Thermal Conductivity (W/m·K) | Ubungakanani beWafer engundoqo | Usetyenziso olungundoqo | Iindleko |
|---|---|---|---|---|---|---|
| Si | 1.12 | ~1,500 | ~150 | 12-intshi | Ingqiqo / iiChips zeMemori | Elona liphantsi |
| IiGaAs | 1.42 | ~8,500 | ~55 | 4–6 intshi | RF / Optoelectronics | Phezulu |
| SiC | 3.26 | ~900 | ~490 | 6-intshi (8-intshi R&D) | Izixhobo zamandla / EV | Phezulu kakhulu |
| GaN | 3.4 | ~2,000 | ~130–170 | 4–6 intshi (heteroepitaxy) | Ukutshaja ngokukhawuleza / RF / LEDs | Phezulu (i-heteroepitaxy: phakathi) |
| InP | 1.35 | ~5,400 | ~70 | 4–6 intshi | Unxibelelwano lwamehlo / THz | Phezulu kakhulu |
| Isafire | 9.9 (isigquduli) | - | ~40 | 4–8 intshi | I-substrates ze-LED | Phantsi |
Imiba ephambili yokuKhethwa kweSubstrate
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Iimfuno zokusebenza:I-GaAs/InP ye-high-frequency; I-SiC ye-voltage ephezulu, ubushushu obuphezulu; I-GaAs/InP/GaN ye-optoelectronics.
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Imiqobo yeendleko:Umthengi we-elektroniki uthanda i-silicon; amasimi aphezulu angathethelela iiprimiyamu zeSiC/GaN.
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Ukudityaniswa kobunzima:I-Silicon ihlala ingenakuthathelwa indawo ukuhambelana kweCMOS.
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Ulawulo lobushushu:Usetyenziso lwamandla aphezulu lukhetha iSiC okanye iGaN esekwe kwidayimane.
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Ukukhula kwekhonkco lonikezelo:Si > Sapphire > GaAs > SiC > GaN > InP.
Ixesha elizayo Trend
Ukuhlanganiswa okungafaniyo (umzekelo, i-GaN-on-Si, i-GaN-on-SiC) iya kulungelelanisa ukusebenza kunye neendleko, ukuqhuba ukuqhubela phambili kwi-5G, izithuthi zombane, kunye ne-quantum computing.
Ixesha lokuposa: Aug-21-2025






