Isishwankathelo esiBanzi seTekhnoloji yokuFaka iFilimu eNcinci: MOCVD, Magnetron Sputtering, kunye nePECVD

Kwimveliso ye-semiconductor, ngelixa i-photolithography kunye ne-etching zezona nkqubo zikhankanywe rhoqo, i-epitaxial okanye ubuchule bokubeka ifilimu encinci bubaluleke ngokulinganayo. Eli nqaku lazisa iindlela ezininzi eziqhelekileyo zokubekwa kwefilimu ezicekethekileyo ezisetyenziselwa ukwenziwa kweetshiphu, kubandakanywaMOCVD, imagnetron sputtering, kwayeI-PECVD.

Kutheni le nto iiNkqubo zeFilimu eziNcinci zibalulekile kwiMveliso yeChip?

Ngokomzekelo, khawube nomfanekiso-ngqondweni wesonka esicaba esibhakiweyo. Ngokwayo, inokuba nencasa emdaka. Noko ke, ngokuxukuxa umphezulu ngeesosi ezahlukeneyo—njengentlama yembotyi enencasa okanye isiraphu eswiti yemalt—unokuyiguqula ngokupheleleyo incasa yayo. Ezi zambatho zokuphucula incasa ziyafanaiifilimu ezincincikwiinkqubo semiconductor, ngelixa isonka esicaba ngokwayo imeleisubstrate.

Kwimveliso ye-chip, iifilimu ezincinci zisebenza imisebenzi emininzi-i-insulation, i-conductivity, i-passivation, i-absorption elula, njl njl-kwaye umsebenzi ngamnye ufuna indlela ethile yokubeka.

1. I-Metal-Organic Chemical Vapor Deposition (MOCVD)

I-MOCVD bubuchule obuphezulu kakhulu nobuchanekileyo obusetyenziselwa ukubekwa kweefilimu ezikumgangatho ophezulu zesemiconductor kunye ne-nanostructures. Idlala indima ebalulekileyo ekwenziweni kwezixhobo ezinjengee-LED, iilaser, kunye nombane wombane.

Amacandelo angundoqo weNkqubo ye-MOCVD:

• Inkqubo yokuhanjiswa kwegesi
  Inoxanduva lokungeniswa ngokuchanekileyo kweereactants kwigumbi lokusabela. Oku kuquka ulawulo lokuhamba:

• Iigesi zokuthwala

• Metal-organic precursors

• Iigesi zeHydride
  Inkqubo ineevalvu zeendlela ezininzi zokutshintsha phakathi kokukhula kunye neendlela zokucoca.

• I-Reaction Chamber
  Intliziyo yenkqubo apho ukukhula kwezinto eziphathekayo kwenzeka. Amacandelo aquka:

  • Isixhasi segraphite (isibambi sesubstrate)

  • Iinzwa zokufudumala kunye nobushushu

  • Amazibuko okukhanya okubeka iliso kwindawo

  • Iingalo zerobhothi zokulayisha / ukothula isisi esizenzekelayo

• Inkqubo yoLawulo lokuKhula
  Iqulathe abalawuli bengqiqo abanokucwangciswa kunye nekhompyuter yenginginya. Oku kuqinisekisa ukubeka iliso okuchanekileyo kunye nokuphindaphinda kuyo yonke inkqubo yokubekwa.

• Ukubeka iliso kwindawo
  Izixhobo ezifana neepyrometers kunye nerefledometers measure:

  • Ubunzima befilimu

  • Ubushushu bomphezulu

  • I-substrate igophe
    Oku kwenza ingxelo yexesha lokwenyani kunye nohlengahlengiso.

• Inkqubo yoNyango lwe-Exhaust
  Uphatha iiproducts ezinetyhefu usebenzisa ukubola kwe-thermal okanye i-catalysis yekhemikhali ukuqinisekisa ukhuseleko kunye nokuthotyelwa kokusingqongileyo.

Ulungelelwaniso lwentloko yeshawari evaliweyo (CCS):

Kwiireactors ze-MOCVD ezithe nkqo, uyilo lweCCS luvumela iigesi ukuba zitofwe ngokufanayo ngokusebenzisa imilomo etshintshanayo kwisakhiwo seshawari. Oku kunciphisa ukuphendula kwangaphambi kwexesha kwaye kwandisa ukuxubana okufanayo.

• Ii-graphite susceptor ejikelezayongakumbi inceda i-homogenize umda womda weegesi, ukuphucula ukufana kwefilimu kwi-wafer.

2. Magnetron Sputtering

I-Magnetron sputtering yindlela yokubeka umphunga womzimba (PVD) esetyenziswa ngokubanzi ukubeka iifilimu ezicekethekileyo kunye neengubo zokwaleka, ngakumbi kwizinto zombane, ii-optics, kunye neeseramikhi.

UmGaqo wokuSebenza:

1. Izinto ekujoliswe kuzo
   Umthombo wezinto eziza kufakwa-isinyithi, i-oxide, i-nitride, njl njl-igxininiswe kwi-cathode.

2. Igumbi lokucoca
   Inkqubo yenziwa phantsi kwevacuum ephezulu ukuphepha ukungcoliseka.

3. Isizukulwana sePlasma
   Irhasi ye-inert, ngokuqhelekileyo i-argon, i-ionized ukwenza i-plasma.

4. Usetyenziso lweMagnetic Field
   Umhlaba wemagnethi uvalela ii-elektroni kufutshane nendawo ekujoliswe kuyo ukuze kuphuculwe ukusebenza kakuhle kwe-ionization.

5. Inkqubo yokuSputtering
   I-Ions ibhobhoza ekujoliswe kuyo, ikhupha ii-athomu ezihamba ngegumbi kwaye zifake kwi-substrate.

Izinto ezilungileyo zeMagnetron Sputtering:

• Ukubekwa kwefilimu efanayokwiindawo ezinkulu.

• Ukukwazi ukuDiphozitha Complex Compounds, kubandakanywa i-alloys kunye neekeramics.

• IiParameters zeNkqubo yeTunablekulawulo oluchanekileyo lobunzima, ukwakheka, kunye ne-microstructure.

• Umgangatho ophezulu wefilimungokubambelela ngamandla kunye namandla omatshini.

• Ukuhambelana kwezinto ezibanzi, ukusuka kwisinyithi ukuya kwii-oxides kunye ne-nitrides.

• Ukusebenza kobushushu obuphantsi, ifanelekile kwii-substrates ezinobushushu.

3. I-Plasma-Enhanced Chemical Vapor Deposition (PECVD)

I-PECVD isetyenziswa ngokubanzi ekubekweni kweefilimu ezibhityileyo njengesilicon nitride (SiNx), isilicon dioxide (SiO₂), kunye nesilicon amorphous.

Umgaqo:

Kwinkqubo ye-PECVD, iigesi ze-precursor zingeniswa kwigumbi le-vacuum apho aiplasma yokukhupha ukukhanyaiveliswa kusetyenziswa:

• RF uchulumanco

• Amandla ombane aphezulu eDC

• Imithombo ye-microwave okanye ipulsed

I-Plasma yenza i-reactions yesigaba segesi, ivelise iintlobo ezisebenzayo ezifaka kwi-substrate ukwenza ifilimu encinci.

Amanyathelo okubekwa:

1. Ukwenziwa kwePlasma
   Uchulumancile ngamasimi ombane we-electromagnetic, iigesi zangaphambili ze-ionize zenze iiradicals ezisebenzayo kunye neeion.

2. Ukusabela kunye noThutho
   Ezi ntlobo zifumana iziphumo zesibini njengoko zisiya kwi-substrate.

3. Ukusabela komphezulu
   Ekufikeleleni kwi-substrate, bayabhengeza, baphendule, kwaye benze ifilimu eqinile. Ezinye iimveliso zikhutshwa njengeegesi.

IiNzuzo ze-PECVD:

• Ukufana okugqwesileyoekubunjweni kwefilimu kunye nobukhulu.

• Ukuncamathela okuqinileyonakumaqondo obushushu obuphantsi kakhulu.

• Amazinga aphezulu okubekwa, okwenza ukuba ilungele imveliso ye-industrial-scale.

4. Iindlela zoBuchule boMlinganiswa weFilimu

Ukuqonda iimpawu zeefilimu ezincinci kubalulekile kulawulo lomgangatho. Ubuchule obuqhelekileyo bubandakanya:

(1) I-X-ray Diffraction (XRD)

• Injongo: Hlalutya izakhiwo zekristale, i-lattice constants, kunye nokuqhelaniswa.

• Umgaqo: Ngokusekelwe kuMthetho kaBragg, imilinganiselo ye-X-rays ehlukana ngayo nge-crystalline material.

• Usetyenziso: I-Crystallography, uhlalutyo lwesigaba, ukulinganiswa koxinzelelo, kunye novavanyo lwefilimu encinci.

(2) Ukuskena i-Electron Microscopy (SEM)

• Injongo: Qwalasela i-morphology yomhlaba kunye ne-microstructure.

• Umgaqo: Isebenzisa umqa we-electron ukuskena umphezulu wesampulu. Iisignali ezichongiweyo (umz., ii-electron eziziisekondari kunye nezisasazwe ngasemva) zityhila iinkcukacha ezingaphezulu.

• Usetyenziso: Inzululwazi yezinto eziphathekayo, i-nanotech, i-biology, kunye nohlalutyo lokungaphumeleli.

(3) I-Atomic Force Microscopy (AFM)

• Injongo: Umphezulu womfanekiso kwi-atom okanye isisombululo se-nanometer.

• Umgaqo: I-probe ebukhali ihlola umphezulu ngelixa igcina amandla okunxibelelana rhoqo; ukufuduswa okuthe nkqo kuvelisa i-3D topography.

• Usetyenziso: Uphando lwe-Nanostructure, ukulinganisa uburhabaxa bomphezulu, izifundo ze-biomolecular.