Isishwankathelo esipheleleyo seendlela zokubeka ifilimu encinci: i-MOCVD, i-Magnetron Sputtering, kunye ne-PECVD

Kwimveliso ye-semiconductor, ngelixa i-photolithography kunye ne-etching zezona nkqubo zikhankanywa rhoqo, iindlela zokubeka ifilimu encinci okanye i-epitaxial zibaluleke ngokulinganayo. Eli nqaku lizisa iindlela ezahlukeneyo zokubeka ifilimu encinci ezisetyenziswa ekwenzeni ii-chip, kubandakanyaI-MOCVD, ukutshiza ngemagnetronkunyeI-PECVD.

Kutheni Iinkqubo Zefilimu Ezincinci Zibalulekile Ekwenziweni KweeChip?

Ngokomzekelo, khawucinge ngesonka esisicaba esibhakiweyo. Sodwa, sinokuba nencasa engathandekiyo. Nangona kunjalo, ngokuxubha umphezulu ngeesosi ezahlukeneyo—njengentlama yembotyi emnandi okanye isiraphu ye-sweet malt—ungayitshintsha ngokupheleleyo incasa yayo. Ezi ngubo zinika incasa zifanaiifilimu ezincincikwiinkqubo ze-semiconductor, ngelixa i-flatbread ngokwayo imeleisiseko sezinto ezingaphantsi komhlaba.

Ekwenzeni iitships, iifilimu ezincinci zisebenza imisebenzi emininzi—ukufaka ubushushu, ukuqhuba umbane, ukuhambisa ukukhanya, njl.njl.—kwaye umsebenzi ngamnye ufuna indlela ethile yokubeka.

1. Ukususwa koMphunga weKhemikhali yeMetal-Organic (MOCVD)

I-MOCVD yindlela ephucukileyo nechanekileyo esetyenziselwa ukubeka iifilimu ezincinci ze-semiconductor kunye nezakhiwo ezincinci ze-nano. Idlala indima ebalulekileyo ekwenziweni kwezixhobo ezifana nee-LED, ii-laser, kunye ne-electronics zamandla.

Izinto eziphambili zeNkqubo ye-MOCVD:

• Inkqubo yokuhanjiswa kwegesi
  Unoxanduva lokungenisa ngokuchanekileyo ii-reactants kwigumbi lokusabela. Oku kuquka ulawulo lokuhamba kwamanzi:

• Iigesi zokuthwala

• Izinto ezisetyenziswa kwi-metal-organic

• Iigesi ze-hydride
  Le nkqubo ineevalvu ezineendlela ezininzi zokutshintsha phakathi kwendlela yokukhula kunye neendlela zokucoca.

• Igumbi lokuphendula
  Intliziyo yenkqubo apho ukukhula kwezinto kwenzeka khona. Izinto ziquka:

  • I-Graphite susceptor (isibambi sesubstrate)

  • Izinzwa zeHeater kunye nobushushu

  • Iiports ezibonakalayo zokujonga indawo

  • Iingalo zerobhothi zokulayisha/ukukhulula iiwafer ngokuzenzekelayo

• Inkqubo yoLawulo loKhula
  Iqulathe abalawuli be-logic abanokucwangciswa kunye nekhompyutha ephetheyo. Ezi ziqinisekisa ukubekwa esweni ngokuchanekileyo kunye nokuphindaphinda kuyo yonke inkqubo yokufaka idatha.

• Ukubeka esweni kwindawo ethile
  Izixhobo ezifana neepyrometers kunye neereflectometers zilinganisa:

  • Ubukhulu befilimu

  • Ubushushu bomphezulu

  • Ukugoba kwe-substrate
    Ezi zivumela impendulo kunye nohlengahlengiso lwexesha langempela.

• Inkqubo Yonyango Lokukhupha Umphunga
  Inyanga iimveliso ezinetyhefu ngokusebenzisa ukubola kobushushu okanye i-catalysis yeekhemikhali ukuqinisekisa ukhuseleko kunye nokuthobela okusingqongileyo.

Uqwalaselo lweShowerhead eValiweyo neQokelelweyo (CCS):

Kwi-reactors ze-MOCVD ezithe nkqo, uyilo lwe-CCS luvumela iigesi ukuba zifakwe ngokulinganayo ngee-nozzles ezitshintshanayo kwisakhiwo se-showerhead. Oku kunciphisa ukusabela kwangaphambi kwexesha kwaye kuphucula ukuxubana okufanayo.

• Ii-graphite susceptor ejikelezayoinceda ngakumbi ekwenzeni umaleko womda weegesi ube mnye, iphucule ukufana kwefilimu kuyo yonke i-wafer.

2. Ukutshiza ngeMagnetron

Ukutshiza ngeMagnetron yindlela yokufumba umphunga ngokwasemzimbeni (iPVD) esetyenziswa kakhulu ekufakeni iifilimu ezincinci kunye neengubo, ngakumbi kwi-elektroniki, kwi-optics, nakwi-ceramics.

Umgaqo Wokusebenza:

1. Izinto ekujoliswe kuzo
   Izinto eziza kufakwa—isinyithi, i-oxide, i-nitride, njl.njl.—zinamathele kwi-cathode.

2. Igumbi lokuVula iVacuum
   Le nkqubo yenziwa phantsi kwe-vacuum ephezulu ukuze kuthintelwe ukungcola.

3. Ukuveliswa kwePlasma
   Igesi engasebenziyo, edla ngokuba yi-argon, ifakwa kwi-ion ukuze yenze i-plasma.

4. Isicelo seMagnetic Field
   Intsimi yemagnethi ivala ii-elektroni kufutshane nendawo ekujoliswe kuyo ukuze kuphuculwe ukusebenza kakuhle kwe-ionization.

5. Inkqubo yokutshiza
   Ii-ion zihlasela ithagethi, zikhupha iiathom ezihamba egumbini zize zihlale kwi-substrate.

Iingenelo zeMagnetron Sputtering:

• Ukubekwa kwefilimu efanayokwiindawo ezinkulu.

• Ubuchule bokufaka iiCompounds ezintsonkothileyo, kuquka ii-alloys kunye neeseramikhi.

• IiParamitha zeNkqubo eziLungiswayoukulawula ngokuchanekileyo ubukhulu, ukwakheka, kunye nesakhiwo esincinci.

• Umgangatho weFilimu oPhezulungokunamathela okunamandla kunye namandla oomatshini.

• Ukuhambelana kwezinto ezibanzi, ukusuka kwiisinyithi ukuya kwii-oxides kunye nee-nitrides.

• Ukusebenza kobushushu obuphantsi, ifanelekile kwiindawo ezibuthathaka kubushushu.

3. Ukususwa koMphunga weKhemikhali oNgcono kwiPlasma (iPECVD)

I-PECVD isetyenziswa kakhulu ekubekeni iifilimu ezincinci ezifana ne-silicon nitride (SiNx), i-silicon dioxide (SiO₂), kunye ne-silicon engenasimo.

Umgaqo:

Kwinkqubo yePECVD, iigesi zangaphambili zifakwa kwigumbi lokucoca umoya aphoiplasma yokukhupha ukukhanyaiveliswa kusetyenziswa:

• Uvuselelo lweRF

• I-DC ephezulu yombane

• Imithombo ye-microwave okanye i-pulsed

I-plasma ivuselela ii-gas-phase reactions, ivelise ii-reactive species ezihlala kwi-substrate ukuze zenze ifilimu encinci.

Amanyathelo okubeka imali:

1. Ukwenziwa kwePlasma
   Zivuyiswa zii-electromagnetic fields, ii-precursor gases ziyayi-ionize ukuze zenze ii-reactive radicals kunye nee-ion.

2. Impendulo kunye nokuThutha
   Ezi ntlobo zifumana iimpendulo zesibini njengoko zisiya kwi-substrate.

3. Impendulo Yomphezulu
   Xa zifika kwi-substrate, ziyafunxa, ziphendule, kwaye zenze ifilimu eqinileyo. Ezinye iimveliso eziphumayo zikhutshwa njengeegesi.

Iingenelo zePECVD:

• Ukufana Okugqwesileyokwisakhiwo sefilimu kunye nobukhulu bayo.

• Ukunamathela Okuqinileyonokuba kubushushu obuphantsi bokugcina.

• Amaxabiso aphezulu okufaka imali, nto leyo eyenza ukuba ifaneleke kwimveliso yemizi-mveliso.

4. Iindlela zoBuchule beFilimu eNcinci

Ukuqonda iimpawu zeefilimu ezincinci kubalulekile ekulawuleni umgangatho. Iindlela eziqhelekileyo ziquka:

(1) Ukwahlukana kwe-X-reyi (XRD)

• Injongo: Hlalutya izakhiwo zekristale, ii-lattice constants, kunye neendlela ezisetyenziswa ngayo.

• Umgaqo: Ngokusekelwe kuMthetho kaBragg, ulinganisa indlela ii-X-ray ezisasazeka ngayo kwizinto ezikristali.

• Izicelo: I-Crystallography, uhlalutyo lwesigaba, ukulinganiswa koxinzelelo, kunye novavanyo lwefilimu encinci.

(2) Ukuskena i-Electron Microscopy (SEM)

• Injongo: Jonga imo yomphezulu kunye nesakhiwo se-microstructure.

• Umgaqo: Isebenzisa umqadi we-electron ukuskena umphezulu wesampuli. Imiqondiso efunyenweyo (umz., ii-electron zesibini kunye nee-backscattered) ityhila iinkcukacha zomphezulu.

• Izicelo: Isayensi yezinto, i-nanotech, i-biology, kunye nohlalutyo lokusilela.

(3) I-Atomic Force Microscopy (AFM)

• Injongo: Imiphezulu yomfanekiso kwisisombululo seathomu okanye se-nanometer.

• Umgaqo: Iprobe ebukhali ihlola umphezulu ngelixa igcina amandla okunxibelelana angaguqukiyo; ukufuduka okuthe nkqo kuvelisa i-3D topography.

• Izicelo: Uphando lwesakhiwo se-nano, ukulinganisa uburhabaxa bomphezulu, izifundo ze-biomolecular.